Alam, S.; Paul, P.; Beladiya, V.; Schmitt, P.; Stenzel, O.; Trost, M.; Wilbrandt, S.; Mühlig, C.; Schröder, S.; Matthäus, G.;
et al. Heterostructure Films of SiO2 and HfO2 for High-Power Laser Optics Prepared by Plasma-Enhanced Atomic Layer Deposition. Coatings 2023, 13, 278.
https://doi.org/10.3390/coatings13020278
AMA Style
Alam S, Paul P, Beladiya V, Schmitt P, Stenzel O, Trost M, Wilbrandt S, Mühlig C, Schröder S, Matthäus G,
et al. Heterostructure Films of SiO2 and HfO2 for High-Power Laser Optics Prepared by Plasma-Enhanced Atomic Layer Deposition. Coatings. 2023; 13(2):278.
https://doi.org/10.3390/coatings13020278
Chicago/Turabian Style
Alam, Shawon, Pallabi Paul, Vivek Beladiya, Paul Schmitt, Olaf Stenzel, Marcus Trost, Steffen Wilbrandt, Christian Mühlig, Sven Schröder, Gabor Matthäus,
and et al. 2023. "Heterostructure Films of SiO2 and HfO2 for High-Power Laser Optics Prepared by Plasma-Enhanced Atomic Layer Deposition" Coatings 13, no. 2: 278.
https://doi.org/10.3390/coatings13020278
APA Style
Alam, S., Paul, P., Beladiya, V., Schmitt, P., Stenzel, O., Trost, M., Wilbrandt, S., Mühlig, C., Schröder, S., Matthäus, G., Nolte, S., Riese, S., Otto, F., Fritz, T., Gottwald, A., & Szeghalmi, A.
(2023). Heterostructure Films of SiO2 and HfO2 for High-Power Laser Optics Prepared by Plasma-Enhanced Atomic Layer Deposition. Coatings, 13(2), 278.
https://doi.org/10.3390/coatings13020278
