Najm, A.S.; Naeem, H.S.; Alwarid, D.A.R.M.; Aljuhani, A.; Hasbullah, S.A.; Hasan, H.A.; Sopian, K.; Bais, B.; Al-Iessa, H.J.; Majdi, H.S.;
et al. Mechanism of Chemical Bath Deposition of CdS Thin Films: Influence of Sulphur Precursor Concentration on Microstructural and Optoelectronic Characterizations. Coatings 2022, 12, 1400.
https://doi.org/10.3390/coatings12101400
AMA Style
Najm AS, Naeem HS, Alwarid DARM, Aljuhani A, Hasbullah SA, Hasan HA, Sopian K, Bais B, Al-Iessa HJ, Majdi HS,
et al. Mechanism of Chemical Bath Deposition of CdS Thin Films: Influence of Sulphur Precursor Concentration on Microstructural and Optoelectronic Characterizations. Coatings. 2022; 12(10):1400.
https://doi.org/10.3390/coatings12101400
Chicago/Turabian Style
Najm, Asmaa Soheil, Hasanain Salah Naeem, Duaa Abdul Rida Musa Alwarid, Abdulwahab Aljuhani, Siti Aishah Hasbullah, Hiba Ali Hasan, Kamaruzzaman Sopian, Badariah Bais, Heidar J. Al-Iessa, Hasan Sh. Majdi,
and et al. 2022. "Mechanism of Chemical Bath Deposition of CdS Thin Films: Influence of Sulphur Precursor Concentration on Microstructural and Optoelectronic Characterizations" Coatings 12, no. 10: 1400.
https://doi.org/10.3390/coatings12101400
APA Style
Najm, A. S., Naeem, H. S., Alwarid, D. A. R. M., Aljuhani, A., Hasbullah, S. A., Hasan, H. A., Sopian, K., Bais, B., Al-Iessa, H. J., Majdi, H. S., Sultan, A. J., & Moria, H.
(2022). Mechanism of Chemical Bath Deposition of CdS Thin Films: Influence of Sulphur Precursor Concentration on Microstructural and Optoelectronic Characterizations. Coatings, 12(10), 1400.
https://doi.org/10.3390/coatings12101400
