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Journal: NanomaterialsVolume: 15Number: 1469
Article: Highly Selective Isotropic Etching of Si to SiGe Using CF4/O2/N2 Plasma for Advanced GAA Nanosheet Transistor
  • Authors:
  • Jiayang Li1,
  • Xin Sun2 and
  • Ziqiang Huang1
  • et al.
Link: https://www.mdpi.com/2079-4991/15/19/1469

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