He, Y.; Zheng, G.; Zhu, B.; Wu, X.; Liu, W.-J.; Zhang, D.W.; Ding, S.-J.
High Performance On-Chip Energy Storage Capacitors with Plasma-Enhanced Atomic Layer-Deposited Hf0.5Zr0.5O2/Al-Doped Hf0.25Zr0.75O2 Nanofilms as Dielectrics. Nanomaterials 2023, 13, 1765.
https://doi.org/10.3390/nano13111765
AMA Style
He Y, Zheng G, Zhu B, Wu X, Liu W-J, Zhang DW, Ding S-J.
High Performance On-Chip Energy Storage Capacitors with Plasma-Enhanced Atomic Layer-Deposited Hf0.5Zr0.5O2/Al-Doped Hf0.25Zr0.75O2 Nanofilms as Dielectrics. Nanomaterials. 2023; 13(11):1765.
https://doi.org/10.3390/nano13111765
Chicago/Turabian Style
He, Yuli, Guang Zheng, Bao Zhu, Xiaohan Wu, Wen-Jun Liu, David Wei Zhang, and Shi-Jin Ding.
2023. "High Performance On-Chip Energy Storage Capacitors with Plasma-Enhanced Atomic Layer-Deposited Hf0.5Zr0.5O2/Al-Doped Hf0.25Zr0.75O2 Nanofilms as Dielectrics" Nanomaterials 13, no. 11: 1765.
https://doi.org/10.3390/nano13111765
APA Style
He, Y., Zheng, G., Zhu, B., Wu, X., Liu, W.-J., Zhang, D. W., & Ding, S.-J.
(2023). High Performance On-Chip Energy Storage Capacitors with Plasma-Enhanced Atomic Layer-Deposited Hf0.5Zr0.5O2/Al-Doped Hf0.25Zr0.75O2 Nanofilms as Dielectrics. Nanomaterials, 13(11), 1765.
https://doi.org/10.3390/nano13111765
