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Article

Ultra-Narrow Metallic Nano-Trenches Realized by Wet Etching and Critical Point Drying

1
Department of Physics and Institute for Accelerator Science, Kangwon National University, 1 Gangwondaehak-gil, Chuncheon-si 24341, Gangwon-do, Korea
2
Department of Physics and Center for Atom Scale Electromagnetism, Ulsan National Institute of Science and Technology, Ulsan 44919, Korea
3
Department of Physics & Astronomy, Seoul National University, Seoul 08826, Korea
4
Department of Physics & Astronomy and Institute of Applied Physics, Seoul National University, Seoul 08826, Korea
*
Authors to whom correspondence should be addressed.
Academic Editor: Doo Jae Park
Nanomaterials 2021, 11(3), 783; https://doi.org/10.3390/nano11030783
Received: 25 February 2021 / Revised: 10 March 2021 / Accepted: 16 March 2021 / Published: 19 March 2021
(This article belongs to the Special Issue Nano-Optics: Novel Research on Theory and Applications)
A metallic nano-trench is a unique optical structure capable of ultrasensitive detection of molecules, active modulation as well as potential electrochemical applications. Recently, wet-etching the dielectrics of metal–insulator–metal structures has emerged as a reliable method of creating optically active metallic nano-trenches with a gap width of 10 nm or less, opening a new venue for studying the dynamics of nanoconfined molecules. Yet, the high surface tension of water in the process of drying leaves the nano-trenches vulnerable to collapsing, limiting the achievable width to no less than 5 nm. In this work, we overcome the technical limit and realize metallic nano-trenches with widths as small as 1.5 nm. The critical point drying technique significantly alleviates the stress applied to the gap in the drying process, keeping the ultra-narrow gap from collapsing. Terahertz spectroscopy of the trenches clearly reveals the signature of successful wet etching of the dielectrics without apparent damage to the gap. We expect that our work will enable various optical and electrochemical studies at a few-molecules-thick level. View Full-Text
Keywords: terahertz; nanoantennas; nano-trenches; critical point drying terahertz; nanoantennas; nano-trenches; critical point drying
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MDPI and ACS Style

Jeong, J.; Yang, H.; Park, S.; Park, Y.D.; Kim, D.-S. Ultra-Narrow Metallic Nano-Trenches Realized by Wet Etching and Critical Point Drying. Nanomaterials 2021, 11, 783. https://doi.org/10.3390/nano11030783

AMA Style

Jeong J, Yang H, Park S, Park YD, Kim D-S. Ultra-Narrow Metallic Nano-Trenches Realized by Wet Etching and Critical Point Drying. Nanomaterials. 2021; 11(3):783. https://doi.org/10.3390/nano11030783

Chicago/Turabian Style

Jeong, Jeeyoon, Hyosim Yang, Seondo Park, Yun D. Park, and Dai-Sik Kim. 2021. "Ultra-Narrow Metallic Nano-Trenches Realized by Wet Etching and Critical Point Drying" Nanomaterials 11, no. 3: 783. https://doi.org/10.3390/nano11030783

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