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Appl. Sci. 2018, 8(6), 897; https://doi.org/10.3390/app8060897

Plasmonic Conglobation of Ultrathin Ag Nanofilms Far below Their Melting Points by Infrared Illumination

1
Laboratory of Composite Materials, Yantai Nanshan University, Longkou 265713, China
2
Shandong Nanshan Aluminum co. LTD. Longkou 264006, China
3
Guizhou University of Engineering Science, Bijie 551700, China
*
Authors to whom correspondence should be addressed.
Received: 2 May 2018 / Revised: 23 May 2018 / Accepted: 23 May 2018 / Published: 30 May 2018
(This article belongs to the Section Nanotechnology and Applied Nanosciences)
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Abstract

Plasmon heating has been employed as a low-temperature annealing method for the conglobation of ultrathin Ag nanofilms into nanoparticles both on silicon and carbon spheres, with complex surface structures, simply under illumination with infrared light. Finite-difference time-domain results provide evidence that the plasmonic light enhancements in the films’ gaps and voids, rather than random surface fluctuations, are the main reason for the conglobation of Ag nanofilms far below the melting point of Ag. This technology can be applied in modern organic optoelectronic devices and photothermal pharma projects to reduce the thermal damage to materials or biological tissues. View Full-Text
Keywords: thin films; plasmonics; photothermal effects; nanomaterials thin films; plasmonics; photothermal effects; nanomaterials
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This is an open access article distributed under the Creative Commons Attribution License which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited. (CC BY 4.0).
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Dai, H.; Zhao, J.; Huang, T.; Yu, X.; Sun, J.; Fang, H.; Zhu, Z.; Zhang, M.; Yu, K. Plasmonic Conglobation of Ultrathin Ag Nanofilms Far below Their Melting Points by Infrared Illumination. Appl. Sci. 2018, 8, 897.

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