Vlnieska, V.; Zakharova, M.; Börner, M.; Bade, K.; Mohr, J.; Kunka, D.
Chemical and Molecular Variations in Commercial Epoxide Photoresists for X-ray Lithography. Appl. Sci. 2018, 8, 528.
https://doi.org/10.3390/app8040528
AMA Style
Vlnieska V, Zakharova M, Börner M, Bade K, Mohr J, Kunka D.
Chemical and Molecular Variations in Commercial Epoxide Photoresists for X-ray Lithography. Applied Sciences. 2018; 8(4):528.
https://doi.org/10.3390/app8040528
Chicago/Turabian Style
Vlnieska, Vitor, Margarita Zakharova, Martin Börner, Klaus Bade, Jürgen Mohr, and Danays Kunka.
2018. "Chemical and Molecular Variations in Commercial Epoxide Photoresists for X-ray Lithography" Applied Sciences 8, no. 4: 528.
https://doi.org/10.3390/app8040528
APA Style
Vlnieska, V., Zakharova, M., Börner, M., Bade, K., Mohr, J., & Kunka, D.
(2018). Chemical and Molecular Variations in Commercial Epoxide Photoresists for X-ray Lithography. Applied Sciences, 8(4), 528.
https://doi.org/10.3390/app8040528