Baek, D.-H.; Park, B.-G.; Lee, S.-W.; Dinh, T.-V.; Kim, J.-C.
Investigation into the Best Available Moisture Pretreatment Approach for the Measurement of Trichloroethylene and Nitrous Oxide Emitted from Semiconductor Industries. Atmosphere 2025, 16, 468.
https://doi.org/10.3390/atmos16040468
AMA Style
Baek D-H, Park B-G, Lee S-W, Dinh T-V, Kim J-C.
Investigation into the Best Available Moisture Pretreatment Approach for the Measurement of Trichloroethylene and Nitrous Oxide Emitted from Semiconductor Industries. Atmosphere. 2025; 16(4):468.
https://doi.org/10.3390/atmos16040468
Chicago/Turabian Style
Baek, Da-Hyun, Byeong-Gyu Park, Sang-Woo Lee, Trieu-Vuong Dinh, and Jo-Chun Kim.
2025. "Investigation into the Best Available Moisture Pretreatment Approach for the Measurement of Trichloroethylene and Nitrous Oxide Emitted from Semiconductor Industries" Atmosphere 16, no. 4: 468.
https://doi.org/10.3390/atmos16040468
APA Style
Baek, D.-H., Park, B.-G., Lee, S.-W., Dinh, T.-V., & Kim, J.-C.
(2025). Investigation into the Best Available Moisture Pretreatment Approach for the Measurement of Trichloroethylene and Nitrous Oxide Emitted from Semiconductor Industries. Atmosphere, 16(4), 468.
https://doi.org/10.3390/atmos16040468