Kerber, M.; Spieckermann, F.; Schuster, R.; Joni, B.; Schell, N.; Schafler, E.
In-Situ Synchrotron Profile Analysis after High-Pressure Torsion Deformation. Crystals 2019, 9, 232.
https://doi.org/10.3390/cryst9050232
AMA Style
Kerber M, Spieckermann F, Schuster R, Joni B, Schell N, Schafler E.
In-Situ Synchrotron Profile Analysis after High-Pressure Torsion Deformation. Crystals. 2019; 9(5):232.
https://doi.org/10.3390/cryst9050232
Chicago/Turabian Style
Kerber, Michael, Florian Spieckermann, Roman Schuster, Bertalan Joni, Norbert Schell, and Erhard Schafler.
2019. "In-Situ Synchrotron Profile Analysis after High-Pressure Torsion Deformation" Crystals 9, no. 5: 232.
https://doi.org/10.3390/cryst9050232
APA Style
Kerber, M., Spieckermann, F., Schuster, R., Joni, B., Schell, N., & Schafler, E.
(2019). In-Situ Synchrotron Profile Analysis after High-Pressure Torsion Deformation. Crystals, 9(5), 232.
https://doi.org/10.3390/cryst9050232