Erratum: De Teresa, J.M. et al. Comparison between Focused Electron/Ion Beam-Induced Deposition at Room Temperature and under Cryogenic Conditions. Micromachines 2019, 10, 799

José María De Teresa; Pablo Orús; Rosa Córdoba; Patrick Philipp

doi:10.3390/mi11020211

,

and

¹

Instituto de Ciencia de Materiales de Aragón (ICMA, CSIC-Universidad de Zaragoza) and Departamento de Física de la Materia Condensada, Facultad de Ciencias, Universidad de Zaragoza, Calle Pedro Cerbuna 12, 50009 Zaragoza, Spain

²

Laboratorio de Microscopías Avanzadas (LMA), Instituto de Nanociencia de Aragón (INA), Edificio de I+D, Campus Río Ebro, 50018 Zaragoza, Spain

³

Instituto de Ciencia Molecular, Universitat de València, Catedrático José Beltrán 2, 46980 Paterna, Spain

⁴

Advanced Instrumentation for Ion Nano-Analytics (AINA), MRT Department, Luxembourg Institute of Science and Technology (LIST), 41 rue du Brill, L-4422 Belvaux, Luxembourg

Micromachines2020, 11(2), 211;https://doi.org/10.3390/mi11020211

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In Section 3.1 (page 4) [1], on the fourth line, it says “C/cm²”. It should be changed to “μC/cm²”.

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References

De Teresa, J.M.; Orús, P.; Córdoba, R.; Philipp, P. Comparison between Focused Electron/Ion Beam-Induced Deposition at Room Temperature and under Cryogenic Conditions. Micromachines 2019, 10, 799. [Google Scholar] [CrossRef] [PubMed]

© 2020 by the authors. Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (http://creativecommons.org/licenses/by/4.0/).

Erratum: De Teresa, J.M. et al. Comparison between Focused Electron/Ion Beam-Induced Deposition at Room Temperature and under Cryogenic Conditions. Micromachines 2019, 10, 799

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