Article Versions Notes

Duan X, Lu C, Chuai X, Chen Q, Yang G, Geng D. A Direct n⁺-Formation Process by Magnetron Sputtering an Inter-Layer Dielectric for Self-Aligned Coplanar Indium Gallium Zinc Oxide Thin-Film Transistors. Micromachines. 2022; 13(5):652. https://doi.org/10.3390/mi13050652

Duan, Xinlv, Congyan Lu, Xichen Chuai, Qian Chen, Guanhua Yang, and Di Geng. 2022. "A Direct n⁺-Formation Process by Magnetron Sputtering an Inter-Layer Dielectric for Self-Aligned Coplanar Indium Gallium Zinc Oxide Thin-Film Transistors" Micromachines 13, no. 5: 652. https://doi.org/10.3390/mi13050652

Duan, X., Lu, C., Chuai, X., Chen, Q., Yang, G., & Geng, D. (2022). A Direct n⁺-Formation Process by Magnetron Sputtering an Inter-Layer Dielectric for Self-Aligned Coplanar Indium Gallium Zinc Oxide Thin-Film Transistors. Micromachines, 13(5), 652. https://doi.org/10.3390/mi13050652