Hsieh, C.-H.; Chang, C.-Y.; Hsiao, Y.-K.; Chen, C.-C.A.; Tu, C.-C.; Kuo, H.-C.
Recent Advances In Silicon Carbide Chemical Mechanical Polishing Technologies. Micromachines 2022, 13, 1752.
https://doi.org/10.3390/mi13101752
AMA Style
Hsieh C-H, Chang C-Y, Hsiao Y-K, Chen C-CA, Tu C-C, Kuo H-C.
Recent Advances In Silicon Carbide Chemical Mechanical Polishing Technologies. Micromachines. 2022; 13(10):1752.
https://doi.org/10.3390/mi13101752
Chicago/Turabian Style
Hsieh, Chi-Hsiang, Che-Yuan Chang, Yi-Kai Hsiao, Chao-Chang A. Chen, Chang-Ching Tu, and Hao-Chung Kuo.
2022. "Recent Advances In Silicon Carbide Chemical Mechanical Polishing Technologies" Micromachines 13, no. 10: 1752.
https://doi.org/10.3390/mi13101752
APA Style
Hsieh, C.-H., Chang, C.-Y., Hsiao, Y.-K., Chen, C.-C. A., Tu, C.-C., & Kuo, H.-C.
(2022). Recent Advances In Silicon Carbide Chemical Mechanical Polishing Technologies. Micromachines, 13(10), 1752.
https://doi.org/10.3390/mi13101752