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Journal: MicromachinesVolume: 13Number: 1556
Article: The Reflectance Characteristics of an Inverse Moth-Eye Structure in a Silicon Substrate Depending on SF6/O2 Plasma Etching Conditions
  • Authors:
  • Jong-Chang Woo1 and
  • Doo-Seung Um2,*
Link: https://www.mdpi.com/2072-666X/13/10/1556

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