Article Versions Notes

Liu F, Wang Z, Nakanao S, Ogawa S, Morita Y, Schmidt M, Haque M, Muruganathan M, Mizuta H. Conductance Tunable Suspended Graphene Nanomesh by Helium Ion Beam Milling. Micromachines. 2020; 11(4):387. https://doi.org/10.3390/mi11040387

Liu, Fayong, Zhongwang Wang, Soya Nakanao, Shinichi Ogawa, Yukinori Morita, Marek Schmidt, Mayeesha Haque, Manoharan Muruganathan, and Hiroshi Mizuta. 2020. "Conductance Tunable Suspended Graphene Nanomesh by Helium Ion Beam Milling" Micromachines 11, no. 4: 387. https://doi.org/10.3390/mi11040387

Liu, F., Wang, Z., Nakanao, S., Ogawa, S., Morita, Y., Schmidt, M., Haque, M., Muruganathan, M., & Mizuta, H. (2020). Conductance Tunable Suspended Graphene Nanomesh by Helium Ion Beam Milling. Micromachines, 11(4), 387. https://doi.org/10.3390/mi11040387