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Open AccessArticle

Influence of Post-Annealing on the Structural and Nanomechanical Properties of Co Thin Films

Department of Mechanical and Electro-Mechanical Engineering, National Sun Yat-Sen University, Kaohsiung 804, Taiwan
Department of Materials Science and Engineering, I-Shou University, Kaohsiung 840, Taiwan
Department of Physics, National Chung Cheng University, Chia-Yi 621, Taiwan
Department of Electrophysics, National Chiao Tung University, Hsinchu 300, Taiwan
Authors to whom correspondence should be addressed.
Micromachines 2020, 11(2), 180;
Received: 24 January 2020 / Revised: 7 February 2020 / Accepted: 7 February 2020 / Published: 10 February 2020
The correlations between the microstructure and nanomechanical properties of a series of thermal annealed Co thin films were investigated. The Co thin films were deposited on glass substrates using a magnetron sputtering system at ambient conditions followed by subsequent annealing conducted at various temperatures ranging from 300 C to 800 C. The XRD results indicated that for annealing temperature in the ranged from 300 C to 500 C, the Co thin films were of single hexagonal close-packed (hcp) phase. Nevertheless, the coexistence of hcp-Co (002) and face-centered cubic (fcc-Co (111)) phases was evidently observed for films annealed at 600 C. Further increasing the annealing temperature to 700 C and 800 C, the films evidently turned into fcc-Co (111). Moreover, significant variations in the hardness and Young’s modulus are observed by continuous stiffness nanoindentation measurement for films annealed at different temperatures. The correlations between structures and properties are discussed.
Keywords: Co thin films; XRD; pop-in; nanoindentation Co thin films; XRD; pop-in; nanoindentation
MDPI and ACS Style

Hwang, Y.-M.; Pan, C.-T.; Lu, Y.-X.; Jian, S.-R.; Chang, H.-W.; Juang, J.-Y. Influence of Post-Annealing on the Structural and Nanomechanical Properties of Co Thin Films. Micromachines 2020, 11, 180.

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