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Fabrication of Crack-Free Barium Titanate Thin Film with High Dielectric Constant Using Sub-Micrometric Scale Layer-by-Layer E-Jet Deposition

Key Laboratory for Micro/Nano Technology and System of Liaoning Province, Dalian University of Technology, Dalian 116023, China
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Academic Editor: Douglas Ivey
Materials 2016, 9(1), 61; https://doi.org/10.3390/ma9010061
Received: 4 December 2015 / Revised: 6 January 2016 / Accepted: 14 January 2016 / Published: 19 January 2016
Dense and crack-free barium titanate (BaTiO3, BTO) thin films with a thickness of less than 4 μm were prepared by using sub-micrometric scale, layer-by-layer electrohydrodynamic jet (E-jet) deposition of the suspension ink which is composed of BTO nanopowder and BTO sol. Impacts of the jet height and line-to-line pitch of the deposition on the micro-structure of BTO thin films were investigated. Results show that crack-free BTO thin films can be prepared with 4 mm jet height and 300 μm line-to-line pitch in this work. Dielectric constant of the prepared BTO thin film was recorded as high as 2940 at 1 kHz at room temperature. Meanwhile, low dissipation factor of the BTO thin film of about 8.6% at 1 kHz was also obtained. The layer-by-layer E-jet deposition technique developed in this work has been proved to be a cost-effective, flexible and easy to control approach for the preparation of high-quality solid thin film. View Full-Text
Keywords: BTO; Thin film; Crack-free; E-jet deposition BTO; Thin film; Crack-free; E-jet deposition
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MDPI and ACS Style

Liang, J.; Li, P.; Wang, D.; Fang, X.; Ding, J.; Wu, J.; Tang, C. Fabrication of Crack-Free Barium Titanate Thin Film with High Dielectric Constant Using Sub-Micrometric Scale Layer-by-Layer E-Jet Deposition. Materials 2016, 9, 61.

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