Kim, J.; Lee, C.-J.; Lee, D.-G.; Lee, G.-H.; Hyeon, J.; Choi, Y.; Cho, N.
Controlling the Dissolution Behavior of (Meth)acrylate-Based Photoresist Polymers in Tetramethylammonium Hydroxide by Introducing Adamantyl Groups. Materials 2025, 18, 381.
https://doi.org/10.3390/ma18020381
AMA Style
Kim J, Lee C-J, Lee D-G, Lee G-H, Hyeon J, Choi Y, Cho N.
Controlling the Dissolution Behavior of (Meth)acrylate-Based Photoresist Polymers in Tetramethylammonium Hydroxide by Introducing Adamantyl Groups. Materials. 2025; 18(2):381.
https://doi.org/10.3390/ma18020381
Chicago/Turabian Style
Kim, Jinyoung, Choong-Jae Lee, Dong-Gun Lee, Geon-Ho Lee, Jayoung Hyeon, Yura Choi, and Namchul Cho.
2025. "Controlling the Dissolution Behavior of (Meth)acrylate-Based Photoresist Polymers in Tetramethylammonium Hydroxide by Introducing Adamantyl Groups" Materials 18, no. 2: 381.
https://doi.org/10.3390/ma18020381
APA Style
Kim, J., Lee, C.-J., Lee, D.-G., Lee, G.-H., Hyeon, J., Choi, Y., & Cho, N.
(2025). Controlling the Dissolution Behavior of (Meth)acrylate-Based Photoresist Polymers in Tetramethylammonium Hydroxide by Introducing Adamantyl Groups. Materials, 18(2), 381.
https://doi.org/10.3390/ma18020381