Article Versions Notes

Oh C, Ju MW, Jeong H, Song JH, Kim BS, Lee DG, Cho C. Dry Etching Characteristics of InGaZnO Thin Films Under Inductively Coupled Plasma–Reactive-Ion Etching with Hydrochloride and Argon Gas Mixture. Materials. 2024; 17(24):6241. https://doi.org/10.3390/ma17246241

Oh, Changyong, Myeong Woo Ju, Hojun Jeong, Jun Ho Song, Bo Sung Kim, Dae Gyu Lee, and ChoongHo Cho. 2024. "Dry Etching Characteristics of InGaZnO Thin Films Under Inductively Coupled Plasma–Reactive-Ion Etching with Hydrochloride and Argon Gas Mixture" Materials 17, no. 24: 6241. https://doi.org/10.3390/ma17246241

Oh, C., Ju, M. W., Jeong, H., Song, J. H., Kim, B. S., Lee, D. G., & Cho, C. (2024). Dry Etching Characteristics of InGaZnO Thin Films Under Inductively Coupled Plasma–Reactive-Ion Etching with Hydrochloride and Argon Gas Mixture. Materials, 17(24), 6241. https://doi.org/10.3390/ma17246241