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Journal: MaterialsVolume: 16Number: 1148
Article: Dispersion and Polishing Mechanism of a Novel CeO2-LaOF-Based Chemical Mechanical Polishing Slurry for Quartz Glass
  • Authors:
  • Zifeng Zhao1,
  • Zhenyu Zhang1,* and
  • Chunjing Shi2
  • et al.
Link: https://www.mdpi.com/1996-1944/16/3/1148

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