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Article

Effect of Boron Doping on the Interlayer Spacing of Graphite

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College of Materials Science and Engineering, Hunan University, Changsha 410082, China
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Hunan Provincial Key Laboratory of Flexible Electronic Materials Genome Engineering, School of Physics and Electronic Sciences, Changsha University of Science and Technology, Changsha 410114, China
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College of Materials Science and Engineering, Changsha University of Science & Technology, Changsha 410114, China
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Hunan Zhongke Shinzoom Co., Ltd., Changsha 410118, China
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Authors to whom correspondence should be addressed.
Academic Editor: Marek Sierka
Materials 2022, 15(12), 4203; https://doi.org/10.3390/ma15124203
Received: 16 May 2022 / Revised: 4 June 2022 / Accepted: 9 June 2022 / Published: 13 June 2022
Boron-doped graphite was prepared by the heat treatment of coke using B4C powder as a graphitization catalyst to investigate the effects of the substitutional boron atoms on the interlayer spacing of graphite. Boron atoms can be successfully incorporated into the lattice of graphite by heat treatment, resulting in a reduction in the interlayer spacing of graphite to a value close to that of ideal graphite (0.3354 nm). With an increase in the catalyst mass ratio, the content of substituted boron in the samples increased significantly, causing a decrease in the interlayer spacing of the boron-doped graphite. Density functional theory calculations suggested that the effects of the substitutional boron atoms on the interlayer spacing of the graphite may be attributed to the transfer of Π electrons between layers, the increase in the electrostatic surface potential of the carbon layer due to the electron-deficient nature of boron atoms, and Poisson contraction along the c-axis. View Full-Text
Keywords: boron-doped graphite; substitutional boron; interlayer spacing; DFT calculations boron-doped graphite; substitutional boron; interlayer spacing; DFT calculations
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MDPI and ACS Style

Bao, C.; Zeng, Q.; Li, F.; Shi, L.; Wu, W.; Yang, L.; Chen, Y.; Liu, H. Effect of Boron Doping on the Interlayer Spacing of Graphite. Materials 2022, 15, 4203. https://doi.org/10.3390/ma15124203

AMA Style

Bao C, Zeng Q, Li F, Shi L, Wu W, Yang L, Chen Y, Liu H. Effect of Boron Doping on the Interlayer Spacing of Graphite. Materials. 2022; 15(12):4203. https://doi.org/10.3390/ma15124203

Chicago/Turabian Style

Bao, Chenguang, Qing Zeng, Fujin Li, Lei Shi, Wei Wu, Li Yang, Yuxi Chen, and Hongbo Liu. 2022. "Effect of Boron Doping on the Interlayer Spacing of Graphite" Materials 15, no. 12: 4203. https://doi.org/10.3390/ma15124203

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