Han, F.; Zhao, W.; Bi, R.; Tian, F.; Li, Y.; Zheng, C.; Wang, Y.
Influence Mechanism of Cu Layer Thickness on Photoelectric Properties of IWO/Cu/IWO Films. Materials 2020, 13, 113.
https://doi.org/10.3390/ma13010113
AMA Style
Han F, Zhao W, Bi R, Tian F, Li Y, Zheng C, Wang Y.
Influence Mechanism of Cu Layer Thickness on Photoelectric Properties of IWO/Cu/IWO Films. Materials. 2020; 13(1):113.
https://doi.org/10.3390/ma13010113
Chicago/Turabian Style
Han, Fengbo, Wenyuan Zhao, Ran Bi, Feng Tian, Yadan Li, Chuantao Zheng, and Yiding Wang.
2020. "Influence Mechanism of Cu Layer Thickness on Photoelectric Properties of IWO/Cu/IWO Films" Materials 13, no. 1: 113.
https://doi.org/10.3390/ma13010113
APA Style
Han, F., Zhao, W., Bi, R., Tian, F., Li, Y., Zheng, C., & Wang, Y.
(2020). Influence Mechanism of Cu Layer Thickness on Photoelectric Properties of IWO/Cu/IWO Films. Materials, 13(1), 113.
https://doi.org/10.3390/ma13010113