Sun, L.; Shao, T.; Shi, Z.; Huang, J.; Ye, X.; Jiang, X.; Wu, W.; Yang, L.; Zheng, W.
Ultraviolet Laser Damage Dependence on Contamination Concentration in Fused Silica Optics during Reactive Ion Etching Process. Materials 2018, 11, 577.
https://doi.org/10.3390/ma11040577
AMA Style
Sun L, Shao T, Shi Z, Huang J, Ye X, Jiang X, Wu W, Yang L, Zheng W.
Ultraviolet Laser Damage Dependence on Contamination Concentration in Fused Silica Optics during Reactive Ion Etching Process. Materials. 2018; 11(4):577.
https://doi.org/10.3390/ma11040577
Chicago/Turabian Style
Sun, Laixi, Ting Shao, Zhaohua Shi, Jin Huang, Xin Ye, Xiaodong Jiang, Weidong Wu, Liming Yang, and Wanguo Zheng.
2018. "Ultraviolet Laser Damage Dependence on Contamination Concentration in Fused Silica Optics during Reactive Ion Etching Process" Materials 11, no. 4: 577.
https://doi.org/10.3390/ma11040577
APA Style
Sun, L., Shao, T., Shi, Z., Huang, J., Ye, X., Jiang, X., Wu, W., Yang, L., & Zheng, W.
(2018). Ultraviolet Laser Damage Dependence on Contamination Concentration in Fused Silica Optics during Reactive Ion Etching Process. Materials, 11(4), 577.
https://doi.org/10.3390/ma11040577