Kim, S.-J.; Choi, M.-S.; Lee, S.-H.; Jeong, W.-N.; Lee, Y.-S.; Seong, I.-H.; Cho, C.-H.; Kim, D.-W.; You, S.-J.
Development of the Tele-Measurement of Plasma Uniformity via Surface Wave Information (TUSI) Probe for Non-Invasive In-Situ Monitoring of Electron Density Uniformity in Plasma Display Fabrication Process. Sensors 2023, 23, 2521.
https://doi.org/10.3390/s23052521
AMA Style
Kim S-J, Choi M-S, Lee S-H, Jeong W-N, Lee Y-S, Seong I-H, Cho C-H, Kim D-W, You S-J.
Development of the Tele-Measurement of Plasma Uniformity via Surface Wave Information (TUSI) Probe for Non-Invasive In-Situ Monitoring of Electron Density Uniformity in Plasma Display Fabrication Process. Sensors. 2023; 23(5):2521.
https://doi.org/10.3390/s23052521
Chicago/Turabian Style
Kim, Si-Jun, Min-Su Choi, Sang-Ho Lee, Won-Nyoung Jeong, Young-Seok Lee, In-Ho Seong, Chul-Hee Cho, Dae-Woong Kim, and Shin-Jae You.
2023. "Development of the Tele-Measurement of Plasma Uniformity via Surface Wave Information (TUSI) Probe for Non-Invasive In-Situ Monitoring of Electron Density Uniformity in Plasma Display Fabrication Process" Sensors 23, no. 5: 2521.
https://doi.org/10.3390/s23052521
APA Style
Kim, S.-J., Choi, M.-S., Lee, S.-H., Jeong, W.-N., Lee, Y.-S., Seong, I.-H., Cho, C.-H., Kim, D.-W., & You, S.-J.
(2023). Development of the Tele-Measurement of Plasma Uniformity via Surface Wave Information (TUSI) Probe for Non-Invasive In-Situ Monitoring of Electron Density Uniformity in Plasma Display Fabrication Process. Sensors, 23(5), 2521.
https://doi.org/10.3390/s23052521
