Search Results (12)

SiAlCN coatings were first obtained by the method of reactive evaporation of aluminum and plasma chemical activation of an organosilicon precursor in a hollow cathode arc discharge. The spectrum of discharge plasma was studied by optical emission spectroscopy under conditions of evaporation of Al in an Ar+N₂+hexamethyldisilazane vapor/gas medium, and it was shown that in the presence of a metal component in the plasma, not only did intensive activation of various components of the media occur but also an increased ionic effect on the surface of the coating was provided, with a deposition rate of up to 10.1 µm/h. The films had a dense and homogeneous structure and had a hardness of up to 31 GPa and good adhesion on stainless steel. The results of SEM, FTIR, and XRD showed that their structure was a nanocomposite consisting of an amorphous matrix based on SiCN and AlN with inclusions of AlCN nanocrystals. Full article

Dense homogeneous nanocomposite TiSiCN coatings with a thickness of up to 15 microns and a hardness of up to 42 GPa were obtained by the method of reactive titanium evaporation in a hollow cathode arc discharge in an Ar + C₂H₂ + N₂-gas mixture with the addition of hexamethyldisilazane (HMDS). An analysis of the plasma composition showed that this method allowed for a wide range of changes in the activation degree of all components of the gas mixture, providing a high (up to 20 mA/cm²) ion current density. It is possible to widely change the chemical composition, microstructure, deposition rate, and properties of coatings obtained by this method, by changing the pressure, composition, and activation degree of the vapor–gas mixture. An increase in the fluxes of C₂H₂, N₂, HMDS, and discharge current leads to an increase in the rate of coating formation. However, the optimal coatings from the point of view of microhardness were obtained at a low discharge current of 10 A and relatively low contents of C₂H₂ (1 sccm) and HMDS (0.3 g/h), exceeding which leads to a decrease in the hardness of the films and the deterioration of their quality, which can be explained by the excessive ionic exposure and the non-optimal chemical composition of the coatings. Full article

This paper describes a physical vapor deposition (PVD) coating equipment, as well as the according deposition parameters suitable to provide hard nitride coatings on broaches up to a length of 2.2 m. The octagonal-shaped vacuum chamber reached a height of 4.5 m and a diameter of 1.2 m. To explore a sufficient and reproducible film, an adhesion test sample and tools were subjected to a pretreatment in a Cr²⁺ Ar⁺ high-power impulse magnetron sputtering (HIPIMS) plasma prior to the actual film deposition. Two deposition methods were applied: reactive unbalanced magnetron (UBM) sputtering was introduced to deposit TiAlN-based coatings from Ti50Al50 2.5 m long targets. Alternatively, multilayer coatings were generated by reactive simultaneous UBM sputtering from Ti50Al50 and TiAl6V4 targets, respectively, and chromium targets utilizing high-power impulse magnetron sputtering (HIPIMS) technology. In the latter case, three cathodes were furnished with 0.9 m long targets lined up upon each other. A segmented UBM cathode design was described to meet economic deposition if varying tool sample lots in the deferring workpiece lengths have to be handled in industrial practice. The resulting (TiAl/Cr)N multilayer coatings attained typical hardness values of HV 2800 and an adhesion measured by critical load up to 50 N. The cutting performance of this coating was evaluated by simulated shaping tests over a test length of 210 m on C 45 steel. The (TiAlV/Cr)N showed an improved wear behavior by factor of 2 to 3 compared to TiN deposited by cathodic arc operated in an industrial PVD coater. A real comparison was undertaken, applied to a 1.3 m long model broach. (TiAl/Cr)N showed a prolongation in industrial lifetime by 150% compared to TiN. Full article

Zr-based nitrides and oxynitrides were deposited by reactive cathodic arc evaporation in monolayer and double-layer structures with the aim of increasing the corrosion protection of 304L stainless steel (SS) in a biomedical aggressive environment. All coatings had a total thickness of 1.2 µm. Compared to the bare substrate, the surface roughness of the coated samples was higher, the presence of microdroplets being revealed by scanning electron micrography (SEM). The X-ray diffraction investigation of the ZrN phases revealed that the peaks shifted towards lower Bragg angles and the lattice constants increased as a result of Si and O₂ inclusion in ZrN lattice, and of the ion bombardment characteristic of the cathodic arc method, augmented by the applied bias substrate. SS/ZrSiN/ZrSi(N,O) showed the best corrosion performance in an acidic environment (0.9% NaCl and 6% H₂O₂; pH = 4), which was ascribed to the blocking effect of the interfaces, which acted as a corrosion barrier for the electrolyte ingress. Moreover, the aforementioned bilayer had the highest amount of Si and O in the composition of the top layer, forming a stable passive layer with beneficial effects on corrosion protection. Full article

Here, we compare two different transparent conducting oxides (TCOs), namely indium tin oxide (ITO) and indium zinc tin oxide (IZTO), fabricated as transparent conducting films using processes that require different temperatures. ITO and IZTO films were prepared at 230 °C and at room temperature, respectively, on glass and polyethylene terephthalate (PET) substrates using reactive magnetron sputtering. Electrochromic WO₃ films deposited on ITO-based and IZTO-based ECDs using vacuum cathodic arc plasma (CAP) were investigated. IZTO-based ECDs have higher optical transmittance modulation, ΔT = 63% [from T_bleaching (90.01%) to T_coloration (28.51%)], than ITO-based ECDs, ΔT = 59%. ECDs consisted of a working electrochromic electrode (WO₃/IZTO/PET) and a counter-electrode (Pt mesh) in a 0.2 M LiClO₄/perchlorate (LiClO₄/PC) liquid electrolyte solution with an active area of 3 cm × 4 cm a calculated bleaching time t_c of 21.01 s and a coloration time t_b of 4.7 s with varying potential from −1.3 V (coloration potential, V_c) to 0.3 V (bleaching potential, V_b). Full article

A series of metal-free UV/near infrared (NIR)-shielding coatings are successfully fabricated by shielded cathodic arc plasma evaporation (CAPE) and substrate-biased RF magnetron sputtering processes. The UV/NIR-shielding coatings comprising quarter-wave stacks of TiO₂/SiO₂ multilayers and high-conductivity sputter-deposited ITO films with a thickness in the range of 200–600 nm could block IRA and IRB radiations, respectively. The total thicknesses of UV/near infrared-shielding films are in the range from 375 nm to 1513.8 nm. The anatase-phase TiO₂ films with absorption edge located at ∼375 nm were deposited by shielded CAPE at ∼100 °C. Further, the well-crystallized ITO films were found to have high free-electron concentrations (1.12 × 10²¹ cm⁻³), resulting in strong absorption of IRB due to the plasmon resonance absorption. The optimal optical design and ITO film thickness were investigated, and the TiO₂(SiO₂/TiO₂)₃ multilayer combined with an ITO film thickness of 400 nm was found to provide a high NIR-shielding rate of 94.8%, UVB to UVA-shielding rate of 92.7%, and average visible light transmittance of 68.1%. Further, human skin cells protected by a UV/NIR-shielding coating showed significantly decreased reactive oxygen species generation and inflammatory cytokine expression as compared to those of unprotected cells. The results demonstrate that the development of multifunction coatings have potential for transparent heat insulation windows and human skin protection against UV/IR radiations. Full article

Gadolinia doped ceria coatings were elaborated by cathodic arc evaporation from a metallic Ce–Gd (90–10 at.%) target inserted into a conventional multiarc Ti evaporation target in the presence of a reactive argon–oxygen gas mixture. The structural and chemical features of these films were determined by x-ray diffraction and scanning electron microscopy. Their electrical properties were characterized using impedance spectroscopy measurements. It was shown that the as-deposited coatings crystallize in the fluorite type fcc structure of ceria and that their composition is the same as that of the target. The morphology of the coatings is influenced by the evaporation parameter (stress and droplet). The electrical measurements showed two contributions in Nyquist representation and the activation energy was slightly higher than that given in the literature data for the bulk material. Full article

Titanium oxide films were deposited at room temperature and with no applied bias using a filtered cathodic vacuum arc (FCVA) system in a reactive oxygen environment. The dependence of film growth on two process parameters, the working pressure (Pw) and the O₂ partial pressure (p_O2), is described in detail. The composition, morphological features, crystalline structure, and optical properties of the deposited films were systematically studied by Rutherford Back Scattering (RBS), Scanning Electron Microscopy (SEM), X-Ray diffraction (XRD), Raman Spectroscopy, UV-vis spectroscopy, and spectroscopic ellipsometry. This systematic investigation allowed the identification of three different groups or growth regimes according to the stoichiometry and the phase structure of the titanium oxide films. RBS analysis revealed that a wide range of TiO_x stoichiometries (0.6 < × < 2.2) were obtained, including oxygen-deficient, stoichiometric TiO₂ and oxygen-rich films. TiO, Ti₂O₃, rutile-type TiO₂, and amorphous TiO₂ phase structures could be achieved, as confirmed both by Raman and XRD. Therefore, the results showed a highly versatile approach, in which different titanium oxide stoichiometries and crystalline phases especially suited for diverse optical applications can be obtained by changing only two process parameters, in a process at room temperature and without applied bias. Of particular interest are crystalline rutile films with high density to be used in ultra-high reflectance metal-dielectric multilayered mirrors, and reduced-TiO₂ rutile samples with absorption in the visible range as a very promising photocatalyst material. Full article

The reactive cathodic arc deposition technique was used to produce Ti nitride and oxynitride coatings on 304 stainless steel substrates (SS). Both mono (SS/TiN, SS/TiNO) and bilayer coatings (SS/TiN/TiNO and SS/TiNO/TiN) were investigated in terms of elemental and phase composition, microstructure, grain size, morphology, and roughness. The corrosion behavior in a solution consisting of 0.10 M NaCl + 1.96 M H₂O₂ was evaluated, aiming for biomedical applications. The results showed that the coatings were compact, homogeneously deposited on the substrate, and displaying rough surfaces. The XRD analysis indicated that both mono and bilayer coatings showed only cubic phases with (111) and (222) preferred orientations. The highest crystallinity was shown by the SS/TiN coating, as indicated also by the largest grain size of 23.8 nm, which progressively decreased to 16.3 nm for the SS/TiNO monolayer. The oxynitride layers exhibited the best in vitro corrosion resistance either as a monolayer or as a top layer in the bilayer structure, making them a good candidate for implant applications. Full article

A novel two-stage technology combining vacuum electro-spark alloying (VESA) and pulsed cathodic arc evaporation (PCAE) was approbated for the deposition of TiC-based coatings in inert (Ar) and reactive (C₂H₄) atmospheres. The deposition was carried out using a TiC-NiCr-Eu₂O₃ electrode and 5140 steel substrates. Structural, elemental, and phase compositions of the deposited coatings were investigated by scanning electron microscopy, energy-dispersive spectrometry, and X-ray diffraction. The mechanical properties of the coatings were measured by nanoindentation using a 4 mN load. The tribological properties of the coatings were measured using the pin-on-disc setup in air and in distilled water at a 5 N load. The experimental data suggest that VESA coatings are characterized by surface defects, a hardness of 12.2 GPa, and a friction coefficient of 0.4. To ensure good adhesion between the VESA coating and the upper layer containing diamond-like carbon (DLC), an intermediate layer was deposited by PCAE in the Ar atmosphere. The intermediate layer had a hardness of up to 31 GPa. The upper layer of the coating ensured a low and stable friction coefficient of 0.2 and high wear resistance due to the formation of an sp²–sp³ bound carbon phase. Multilayer TiC-based coating with the upper DLC layer, in addition to high tribological properties, was characterized by the lowest corrosion current density (12 μA/cm²). Full article

Multilayers of Ti doped diamond-like carbon (Ti-DLC) coatings were deposited on aluminum alloys by filtered cathodic vacuum arc (FCVA) technology using C₂H₂ as a reactive gas. The effect of different Ti transition layer thicknesses on the structure, mechanical and adhesion properties of the coatings, was investigated by scanning electron microscopy (SEM), Raman spectroscopy, X-ray photoelectron spectroscopy (XPS), nanoindentation and a scratch tester. The results showed that the Ti transition layer could improve interfacial transition between the coating and the substrate, which was beneficial in obtaining excellent adhesion of the coatings. The Ti transition layer thickness had no significant influence on the composition and structure of the coatings, whereas it affected the distortion of the sp²-C bond angle and length. Nanoindentation and scratch test results indicated that the mechanical and adhesion properties of the Ti-DLC coatings depended on the Ti transition layer thickness. The Ti transition layer proved favorable in decreasing the residual compressive stress of the coating. As the Ti transition layer thickness increased, the hardness value of the coating gradually decreased. However, its elastic modulus and adhesion exhibited an initial decrease followed by an increasing fluctuation. Among them, the Ti-DLC coating with a Ti transition layer thickness of 1.1 μm exhibited superior mechanical properties. Full article

Chromium nitride and oxynitride coatings were deposited as monolayers ((Cr–N), Cr(N,O)) and bilayers (Cr–N/Cr(N,O), Cr(N,O)/Cr–N) on 304 steel substrates by reactive cathodic arc method. The coatings were characterised by X-ray diffraction (XRD), scanning electron microscopy (SEM), energy dispersive X-ray spectrometry (EDS), surface profilometry, and scratch tester. The anticorrosive properties of the coatings were assessed by electrochemical tests in 0.10 M NaCl + 1.96 M H₂O₂, carried out at 24 °C. Cr₂N, CrN, and Cr(N,O) phases were identified in the coatings by grazing incidence X-ray diffraction (GI-XRD) measurements. The measured adhesion values ranged from 19 N to 35 N, the highest value being obtained for the bilayer with Cr(N,O) on top. Electrochemical tests showed that Cr(N,O) presence in both mono- and bilayered coatings determined the lowest damage in corrosive solution, as compared to the Cr–N coatings. This improvement was ascribed to the more compact structure, lower coatings porosity, and smoother surface. Full article