Tailoring Crystalline Structure of Titanium Oxide Films for Optical Applications Using Non-Biased Filtered Cathodic Vacuum Arc Deposition at Room Temperature
Abstract
:1. Introduction
2. Materials and Methods
3. Results
3.1. Thin Film Growth and Film Composition
3.2. Structure and Morphology
3.3. Optical Properties
4. Discussion
Author Contributions
Funding
Institutional Review Board Statement
Informed Consent Statement
Data Availability Statement
Acknowledgments
Conflicts of Interest
References
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pO2 (Pa) | Peak Position (2θ) | (h k l) | d (Å) | a (Å) | c (Å) |
---|---|---|---|---|---|
Reference (TiO) (ICC card 01-077-2170) | 37.18 43.20 62.74 75.24 | (111) (200) (220) (311) | 2.416 2.092 1.479 1.261 | 4.18 | 4.18 |
0.04 | 36.60 42.87 62.38 75.01 | (111) (200) (220) (311) | 2.45 2.10 1.48 1.26 | 4.25 4.21 4.21 4.19 | 4.25 4.21 4.21 4.19 |
0.05 | 37.71 43.72 - 76.54 | (111) (200) (220) (311) | 2.38 2.07 - 1.24 | 4.13 4.14 - 4.12 | 4.13 4.14 - 4.12 |
0.06 | 37.01 - 62.92 - | (111) (200) (220) (311) | 2.42 - 1.47 - | 4.20 - 4.17 - | |
Reference (Ti2O3) (ICC card 00-010-0063) | 34.85 40.26 53.75 61.34 62.58 86.98 | (110) (113) (116) (214) (300) (226) | 2.57 2.23 1.70 1.51 1.48 1.11 | 5.13 | 13.65 |
0.07 | 35.00 40.66 54.21 61.23 63.40 87.69 | (110) (113) (116) (214) (300) (226) | 2.53 2.21 1.69 1.51 1.46 1.11 | - | - |
pO2 (Pa) | Peak Position (2θ) | (h k l) | d (Å) | a (Å) | c (Å) | Crystallite Size (nm) Average |
---|---|---|---|---|---|---|
Reference Rutile TiO2 (ICC card 01-077-0444) | 27.29 53.98 56.30 | (110) (211) (220) | 3.265 1.697 1.632 | 4.61 | 2.97 | - |
0.10 | 27.39 54.06 56.07 | (110) (211) (220) | 3.252 1.694 1.639 | 4.60 | 2.99 | 6.60 ± 0.80 |
0.16 | 27.38 54.21 56.57 | (110) (211) (220) | 3.254 1.690 1.625 | 4.60 | 2.96 | 5.55 ± 0.99 |
0.20 | 27.33 54.04 56.33 | (110) (211) (220) | 3.254 1.690 1.625 | 4.61 | 2.98 | 6.00 ± 0.12 |
Ref. | Bias | T° | Pw (Pa) | Crystalline phase | n |
---|---|---|---|---|---|
Zhang and Liu, 1998 [28] | −400 V | 300 °C | 0.04, 0.2 | rutile | |
Zhang et al., 1998 [29] | 0 to 400 V | 300 °C | 0, 2 | rutile (bias); amorphous (0V) | |
Bendavid et al., 1999 [30] | 0 to −400V | RT | anatase (0 V); amorphous (−50 V); rutile (−100 to −400 V) | anatase: 2.62; rutile: 2.72 | |
Martin et al., 1999 [31] | amorphous | amorphous: 2.45 | |||
Takikawa et al., 1999 [32] | 0.1–2.0 | amorphous | |||
Bendavid et al., 2000 [17] | 0 to −400V | RT | 0.35 | anatase (0 V); amorphous (−50 V); rutile (−100 to −400 V) | amorphous: 2.56; anatase: 2.62; rutile: 2.72 |
Z. W. Zhao et al., 2004 [33] | - | - | - | amorphous | 2.57 at 550 nm |
Z. Zhao et al., 2004 [27] | - | RT | 0.03 | amorphous | 2.56 at 550 nm |
Huang et al., 2006 [34] | 0, −200, −500V | 450 °C | amorphous (0V); anatase, (−200 V); rutile (−500 V) | ||
Kleiman et al., 2006 [35] | 200–400 °C | amorphous (200 °C); anatase (400 °C) | |||
Kleiman et al., 2007 [36] | no | RT-400 °C | amorphous (<300 °C); anatase (>300 °C) | ||
Zhang et al., 2007 [37] | no | RT | amorphous | 2.51 at 550 nm | |
Zhao, 2007 [38] | amorphous | ||||
Zhang et al., 2007 [37] | 0 to −900V | amorphous | |||
Bendavid et al., 2008 [39] | −50 V to −300 V | RT | 0.3 | anatase and some rutilo | 2.59 at 550 nm |
Zhirkov et al., 2011 [12] | no | amorphous | - | ||
Zhirkov et al., 2011 [12] | 0, −1, −50, −70 V | 500 °C, 300 °C, 150 °C, 200 °C, 15 °C | 0.6, 0.01, 0.006 | 500 °C, 300 °C, no bias: rutile 150 °C (0, −10, −50, −70 V): only a broad (101) rutile peak RT: no bias: amorphous | - |
Arias et al., 2012 [5] | no | RT-570 °C | 2–5 | RT: amorphous (RT); anatase/rutile (in SS, 360 °C); anatase+rutile (400–500 °C); rutile (560 °C) | - |
Paternoster et al., 2013 [40] | 100 °C | PO2 = 0.06 | amorphous (RT); rutile (Tsub ≥ 300 °C) | - | |
Aramwit et al., 2014 [3] | 0 or −250 V | RT | 0.013, 0.13, 1.3, 13 | amorphous (0 V), some rutile (bias) | - |
Franco Arias et al., 2017 [16] | −120 | 300 °C or 400 °C | 5–8 | small rutile and anatase peaks (no Ti interlayer); rutile (with Ti interlayer) | - |
Current work | 0 | RT | 0.02–0.41 | TiO/Ti2O3/RutileTiO2 and amorphous TiO2 | rutile: 2.63 amorphous: 2.57 |
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Guillén, E.; Krause, M.; Heras, I.; Rincón-Llorente, G.; Escobar-Galindo, R. Tailoring Crystalline Structure of Titanium Oxide Films for Optical Applications Using Non-Biased Filtered Cathodic Vacuum Arc Deposition at Room Temperature. Coatings 2021, 11, 233. https://doi.org/10.3390/coatings11020233
Guillén E, Krause M, Heras I, Rincón-Llorente G, Escobar-Galindo R. Tailoring Crystalline Structure of Titanium Oxide Films for Optical Applications Using Non-Biased Filtered Cathodic Vacuum Arc Deposition at Room Temperature. Coatings. 2021; 11(2):233. https://doi.org/10.3390/coatings11020233
Chicago/Turabian StyleGuillén, Elena, Matthias Krause, Irene Heras, Gonzalo Rincón-Llorente, and Ramón Escobar-Galindo. 2021. "Tailoring Crystalline Structure of Titanium Oxide Films for Optical Applications Using Non-Biased Filtered Cathodic Vacuum Arc Deposition at Room Temperature" Coatings 11, no. 2: 233. https://doi.org/10.3390/coatings11020233