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Keywords = photoacid generation

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15 pages, 4386 KiB  
Article
POSS and PAG Dual-Containing Chemically Amplified Photoresists by RAFT Polymerization for Enhanced Thermal Performance and Acid Diffusion Inhibition
by Haimeng Yu, Shaoshuai Liu, Haiyan Fu, Zepeng Cui, Liangshun Zhang and Jia Tian
Appl. Sci. 2024, 14(17), 7722; https://doi.org/10.3390/app14177722 - 2 Sep 2024
Cited by 3 | Viewed by 5060
Abstract
A random copolymer (PTBM), utilized as deep ultra-violet (DUV) photoresist, was prepared by reversible addition-fragmentation chain transfer (RAFT) polymerization with tert-butyl methacrylate (tBMA), methyl methacrylate (MMA), triphenylsulfonium p-styrenesulfonate (TPS-SS), and functional poly (sesquicarbonylsiloxanes) (POSS-MA) as the monomer components, and 4-cyano-4-[(dodecylsulfanylthiocarbonyl) sulfanyl]pentanoic acid [...] Read more.
A random copolymer (PTBM), utilized as deep ultra-violet (DUV) photoresist, was prepared by reversible addition-fragmentation chain transfer (RAFT) polymerization with tert-butyl methacrylate (tBMA), methyl methacrylate (MMA), triphenylsulfonium p-styrenesulfonate (TPS-SS), and functional poly (sesquicarbonylsiloxanes) (POSS-MA) as the monomer components, and 4-cyano-4-[(dodecylsulfanylthiocarbonyl) sulfanyl]pentanoic acid (CDSPA) as the RAFT reagent. Fourier transform infrared spectroscopy (FT-IR) and proton nuclear magnetic resonance (1H NMR) proved successful synthesis. Ultraviolet absorption spectroscopy (UV) analysis verified the transparency of the polymer in the DUV band. RAFT polymerization kinetics showed that the polymerization rate conformed to the first-order kinetic relationship, and the polymerization process exhibited a typical controlled free radical polymerization behavior. Thermogravimetric analysis (TGA), differential scanning calorimetry (DSC) and static thermo-mechanical analysis (TMA) showed that the incorporation of POSS groups improved the thermal properties of the copolymer. According to scanning electron microscopy (SEM) images, the copolymerization of photoacid monomers (TPS-SS) resulted in photoresist copolymers exhibiting good resistance to acid diffusion and low roughness. Full article
(This article belongs to the Section Applied Thermal Engineering)
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9 pages, 3053 KiB  
Communication
Exceptional Lithography Sensitivity Boosted by Hexafluoroisopropanols in Photoresists
by Junjun Liu, Dong Wang, Yitan Li, Haihua Wang, Huan Chen, Qianqian Wang and Wenbing Kang
Polymers 2024, 16(6), 825; https://doi.org/10.3390/polym16060825 - 15 Mar 2024
Cited by 5 | Viewed by 3165
Abstract
Advanced lithography requires highly sensitive photoresists to improve the lithographic efficiency, and it is critical, yet challenging, to develop high-sensitivity photoresists and imaging strategies. Here, we report a novel strategy for ultra-high sensitivity using hexafluoroisopropanol (HFIP)-containing fluoropolymer photoresists. The incorporation of HFIP, with [...] Read more.
Advanced lithography requires highly sensitive photoresists to improve the lithographic efficiency, and it is critical, yet challenging, to develop high-sensitivity photoresists and imaging strategies. Here, we report a novel strategy for ultra-high sensitivity using hexafluoroisopropanol (HFIP)-containing fluoropolymer photoresists. The incorporation of HFIP, with its strong electrophilic property and the electron-withdrawing effect of the fluorine atoms, significantly increases the acidity of the photoresist after exposure, enabling imaging without conventional photoacid generators (PAGs). The HFIP-containing photoresist has been evaluated by electron beam lithography to achieve a trench of ~40 nm at an extremely low dose of 3 μC/cm2, which shows a sensitivity enhancement of ~10 times compared to the commercial system involving PAGs, revealing its high sensitivity and high-resolution features. Our results demonstrate a new type of PAGs and a novel approach to higher-performance imaging beyond conventional photoresist performance tuning. Full article
(This article belongs to the Section Polymer Applications)
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47 pages, 16170 KiB  
Review
Recent Advances in Monocomponent Visible Light Photoinitiating Systems Based on Sulfonium Salts
by Frédéric Dumur
Polymers 2023, 15(21), 4202; https://doi.org/10.3390/polym15214202 - 24 Oct 2023
Cited by 9 | Viewed by 4779
Abstract
During the last decades, multicomponent photoinitiating systems have been the focus of intense research efforts, especially for the design of visible light photoinitiating systems. Although highly reactive three-component and even four-component photoinitiating systems have been designed, the complexity to elaborate such mixtures has [...] Read more.
During the last decades, multicomponent photoinitiating systems have been the focus of intense research efforts, especially for the design of visible light photoinitiating systems. Although highly reactive three-component and even four-component photoinitiating systems have been designed, the complexity to elaborate such mixtures has incited researchers to design monocomponent Type II photoinitiators. Using this approach, the photosensitizer and the radical/cation generator can be combined within a unique molecule, greatly simplifying the elaboration of the photocurable resins. In this field, sulfonium salts are remarkable photoinitiators but these structures lack absorption in the visible range. Over the years, various structural modifications have been carried out in order to redshift their absorptions in the visible region. In this work, an overview of the different sulfonium salts activable under visible light and reported to date is proposed. Full article
(This article belongs to the Special Issue Polymer Coatings: Principles, Methods, and Applications)
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12 pages, 3068 KiB  
Article
Novel Mechanism-Based Descriptors for Extreme Ultraviolet-Induced Photoacid Generation: Key Factors Affecting Extreme Ultraviolet Sensitivity
by Ji Young Park, Hyun-Ji Song, Thanh Cuong Nguyen, Won-Joon Son, Daekeon Kim, Giyoung Song, Suk-Koo Hong, Heeyoung Go, Changmin Park, Inkook Jang and Dae Sin Kim
Molecules 2023, 28(17), 6244; https://doi.org/10.3390/molecules28176244 - 25 Aug 2023
Cited by 7 | Viewed by 3853
Abstract
Predicting photolithography performance in silico for a given materials combination is essential for developing better patterning processes. However, it is still an extremely daunting task because of the entangled chemistry with multiple reactions among many material components. Herein, we investigated the EUV-induced photochemical [...] Read more.
Predicting photolithography performance in silico for a given materials combination is essential for developing better patterning processes. However, it is still an extremely daunting task because of the entangled chemistry with multiple reactions among many material components. Herein, we investigated the EUV-induced photochemical reaction mechanism of a model photoacid generator (PAG), triphenylsulfonium cation, using atomiC–Scale materials modeling to elucidate that the acid generation yield strongly depends on two main factors: the lowest unoccupied molecular orbital (LUMO) of PAG cation associated with the electron-trap efficiency ‘before C–S bond dissociation’ and the overall oxidation energy change of rearranged PAG associated with the proton-generation efficiency ‘after C–S bond dissociation’. Furthermore, by considering stepwise reactions accordingly, we developed a two-parameter-based prediction model predicting the exposure dose of the resist, which outperformed the traditional LUMO-based prediction model. Our model suggests that one should not focus only on the LUMO energies but also on the energy change during the rearrangement process of the activated triphenylsulfonium (TPS) species. We also believe that the model is well suited for computational materials screening and/or inverse design of novel PAG materials with high lithographic performances. Full article
(This article belongs to the Section Computational and Theoretical Chemistry)
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13 pages, 5978 KiB  
Article
New Chemically Amplified Positive Photoresist with Phenolic Resin Modified by GMA and BOC Protection
by Junjun Liu and Wenbing Kang
Polymers 2023, 15(7), 1598; https://doi.org/10.3390/polym15071598 - 23 Mar 2023
Cited by 8 | Viewed by 7692
Abstract
In this paper, a chemically amplified (CA) i-line photoresist system is described including a phenolic resin modified with glycidyl methacrylate (GMA) addition and protected with di-tert-butyl dicarbonate (BOC group), here called JB resin. JB resin with different degrees of BOC protection was synthesized [...] Read more.
In this paper, a chemically amplified (CA) i-line photoresist system is described including a phenolic resin modified with glycidyl methacrylate (GMA) addition and protected with di-tert-butyl dicarbonate (BOC group), here called JB resin. JB resin with different degrees of BOC protection was synthesized and characterized with ultraviolet spectrophotometry, Fourier transform infrared spectroscopy and gel permeation chromatography. These resins were also evaluated in CA resists by formulating the JB resin with a photoacid generator (PAG) and tested at 405 nm and 365 nm exposure wavelengths. The BOC protection ratio at approximately 25 mol% of the Novolak phenol group showed the best performance. The resist showed high sensitivity (approximately 190 mJ/cm2), high resolution and good alkali developer resistance with reliable repeatability, indicating the great practical potential of this JB resist system. Full article
(This article belongs to the Section Polymer Applications)
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15 pages, 3427 KiB  
Article
pH-Induced Orthogonal Photoresponse of trans-Chalcone Isomers and Related Compounds in Equilibria
by Jeonghee Kang, Ketevan Basilashvili, Barney Yoo and Jong I. Lee
Colorants 2023, 2(1), 58-72; https://doi.org/10.3390/colorants2010005 - 17 Feb 2023
Cited by 2 | Viewed by 2987
Abstract
Photoresponsive molecular devices can be a valuable tool to promote chemical changes in response to multiple signals, such as photons and pH, to deliver drugs or to detect physiological conditions in vivo. For example, trans-chalcones (Ct) from 4′-hydroxyflavylium (F1 [...] Read more.
Photoresponsive molecular devices can be a valuable tool to promote chemical changes in response to multiple signals, such as photons and pH, to deliver drugs or to detect physiological conditions in vivo. For example, trans-chalcones (Ct) from 4′-hydroxyflavylium (F1) and 7-hydroxyflavylium (F2) can undergo cis-trans isomerization by photoreaction into many different structures. The isomerization takes place at a slow rate in response to pH change; however, it can be done in seconds by photoreaction. In the investigation, as confirming the previous reports, 3-(2-hydroxy-phenyl)-1-(4-hydroxy-phenyl)-propenone, the trans-chalcone (CtF1) from F1, produces flavylium ions in pH = 1–4.5. Then, we further discovered that the flavylium quickly releases protons to yield the corresponding quinoidal base (A) in a solution of pH = 5.2 during irradiation with 350 nm. Meanwhile, the photolysis of 3-(2,4-dihydroxy-phenyl)-1-phenyl-propenone, the trans-chalcone (CtF2) from F2 at pH = 5.6, induces photoacid behavior by losing a proton from the trans-chalcone to generate Ct2. The different outcomes of these nearly colorless chalcones under similar pH conditions and with the same photochemical conditions can be useful when yielding colored AH+, A, or Ct2 in a mildly acidic pH environment with temporal and spatial control using photochemical means. Full article
(This article belongs to the Special Issue Recent Progress on Functional Dyes and Their Applications)
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12 pages, 1971 KiB  
Article
Post-Polymerization Modification of Fluoropolymers via UV Irradiation in the Presence of a Photoacid Generator
by Anastasia Nika, Christina Gkioka, Fotini Machairioti, Panayiotis Bilalis, Jiaxi Xu, Katarzyna Gajos, Kamil Awsiuk, Panagiota Petrou and Margarita Chatzichristidi
Polymers 2023, 15(3), 493; https://doi.org/10.3390/polym15030493 - 17 Jan 2023
Viewed by 2963
Abstract
Fluorinated polymers have unique wettability and protein adsorption properties. The site-specific alteration of these properties could expand their application to different research areas. In this work, a fluorinated homopolymer and two of its copolymers with 4-vinylbenzyl glycidyl ether (VBGE) are synthesized by free [...] Read more.
Fluorinated polymers have unique wettability and protein adsorption properties. The site-specific alteration of these properties could expand their application to different research areas. In this work, a fluorinated homopolymer and two of its copolymers with 4-vinylbenzyl glycidyl ether (VBGE) are synthesized by free radical polymerization. The produced polymers are then used to develop resist formulations by the addition of a photoacid generator. Films of these formulations are exposed to ultraviolet radiation through a binary mask and heated to create the pattern. It is found that the water contact angle values of the exposed films areas are reduced compared to those of the unexposed ones, with the exception of pentafluorophenyl methacrylate (PFMA) homopolymer film. This is attributed to the reaction of the epoxy groups creating x-links and producing hydroxyl groups and the cleavage of the pentafluorophenyl group from the ester group leading to carboxylic acid groups. Both modifications on the exposed areas are verified by FTIR spectroscopy and ToF-SIMS analysis. In addition, the biomolecules adsorption ability of the exposed area is increasing 10–15 times compared to the unexposed one for the PFMA homopolymer and the PFMA/VBGE 1:1 copolymer. Thus, the proposed polymers and patterning procedure could find application to spatially directed immobilization of biomolecules and/or cells onto a surface for both biosensing and tissue engineering purposes. Full article
(This article belongs to the Section Polymer Chemistry)
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12 pages, 1681 KiB  
Article
Dyeing Non-Recyclable Polyethylene Plastic with Photoacid Phycocyanobilin from Spirulina Algae: Ultrafast Photoluminescence Studies
by Maryam Alhefeiti, Falguni Chandra, Ravindra Kumar Gupta and Na’il Saleh
Polymers 2022, 14(22), 4811; https://doi.org/10.3390/polym14224811 - 9 Nov 2022
Cited by 4 | Viewed by 2508
Abstract
Despite the enormous environmental damage caused by plastic waste, it makes up over one-third of globally produced plastics. Polyethylene (PE) wastes have low recycling but high production rates. Towards the construction of ionic solar cells from PE, the present work describes the loading [...] Read more.
Despite the enormous environmental damage caused by plastic waste, it makes up over one-third of globally produced plastics. Polyethylene (PE) wastes have low recycling but high production rates. Towards the construction of ionic solar cells from PE, the present work describes the loading of a bioactive photoacid phycocyanobilin (PCB) dye from the pigment of Spirulina blue–green algae (as a natural resource) on low-density polyethylene (LDPE) plastic film. Dyeing was confirmed by X-ray photoelectron spectroscopy (XPS). Upon excitation of the Soret-band (400 nm), the photoluminescence (PL) spectra of PCB in neat solvents revealed two prominent emission peaks at 450–550 and 600–700 nm. The first band assigned to bilirubin-like (PCBBR) species predominated the spectral profile in the highly rigid solvent glycerol and upon loading 0.45 % (w/w) of the dye on plastic. The photoluminescence excitation (PLE) spectra of PCB for the second region (Q-band) at 672 nm in the same solvents confirmed the ground state heterogenicity previously associated with the presence of PCBA (neutral), PCBB (cationic), and PCBC (anionic) conformers. Time-resolved photoluminescence (TRPL) measurements induced via excitation of all PCB species at 510 nm in methanol revealed three-lifetime components with τ1 = ~0.1 ns and τ2 = ~2 ns associated with PCBBR species and τ3 = ~5 ns pertinent to the long-living photoproduct X*. Decay-associated spectra (DAS) analysis of the photoluminescence transient spectra of the final dyed films in the solid-state confirmed the improved generation of the long-living photoproduct as manifested in a significant increase in the PL intensity (~100-fold) and lifetime value (~90 ns) in the Q-region upon loading 6.92 % (w/w) of the dye on plastic. The photoproduct species were presumably assigned to the deprotonated PCB species, suggesting improved ionic mobility. The potential implementation of the PCB-sensitized PE solid wastes for the fabrication of ionic solar cells is discussed. Full article
(This article belongs to the Special Issue System for Polymers Recycling and Circular Economy)
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27 pages, 4533 KiB  
Article
Hybrid Tri-Cure Organo-Silicon Coatings for Monument Preservation
by Cory B. Sims, Chamika U. Lenora and Joseph C. Furgal
Coatings 2022, 12(8), 1098; https://doi.org/10.3390/coatings12081098 - 2 Aug 2022
Cited by 8 | Viewed by 3972
Abstract
A coating system integrating three distinct chemistries was developed to protect materials used in monuments and construction. Initial curing is achieved using a UV-initiated thiol-ene reaction to form a non-impressionable/non-sticky surface. Second, amine/epoxy reactions form a firm surface adhesion and give mechanical strength [...] Read more.
A coating system integrating three distinct chemistries was developed to protect materials used in monuments and construction. Initial curing is achieved using a UV-initiated thiol-ene reaction to form a non-impressionable/non-sticky surface. Second, amine/epoxy reactions form a firm surface adhesion and give mechanical strength through consolidation. Third, alkoxysilane sol-gel curing integrates the siloxane network while adding thermal stability, hydrophobicity, and a hardened surface. The final design utilizes a photoacid generator to increase the reaction speed of the second and third curing steps. The coating can be applied by spray, dip, or wipe on methods and exhibits a rapid non-impressionable surface (as fast as 10 min) that resists graffiti and environmental conditions, and is used and stored as a single-component system with a pot life exceeding six months. A series of experiments were used to determine the coating properties and durability, including field testing and accelerated weathering. Full article
(This article belongs to the Special Issue Advanced Coating Material for Heritage Preservation)
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49 pages, 15023 KiB  
Review
Surface-Immobilized Photoinitiators for Light Induced Polymerization and Coupling Reactions
by Matthias Mueller, Christine Bandl and Wolfgang Kern
Polymers 2022, 14(3), 608; https://doi.org/10.3390/polym14030608 - 4 Feb 2022
Cited by 28 | Viewed by 9901
Abstract
Straightforward and versatile surface modification, functionalization and coating have become a significant topic in material sciences. While physical modification suffers from severe drawbacks, such as insufficient stability, chemical induced grafting processes efficiently modify organic and inorganic materials and surfaces due to covalent linkage. [...] Read more.
Straightforward and versatile surface modification, functionalization and coating have become a significant topic in material sciences. While physical modification suffers from severe drawbacks, such as insufficient stability, chemical induced grafting processes efficiently modify organic and inorganic materials and surfaces due to covalent linkage. These processes include the “grafting from” method, where polymer chains are directly grown from the surface in terms of a surface-initiated polymerization and the “grafting to” method where a preformed (macro)-molecule is introduced to a preliminary treated surface via a coupling reaction. Both methods require an initiating species that is immobilized at the surface and can be triggered either by heat or light, whereas light induced processes have recently received increasing interest. Therefore, a major challenge is the ongoing search for suitable anchor moieties that provide covalent linkage to the surface and include initiators for surface-initiated polymerization and coupling reactions, respectively. This review containing 205 references provides an overview on photoinitiators which are covalently coupled to different surfaces, and are utilized for subsequent photopolymerizations and photocoupling reactions. An emphasis is placed on the coupling strategies for different surfaces, including oxides, metals, and cellulosic materials, with a focus on surface coupled free radical photoinitiators (type I and type II). Furthermore, the concept of surface initiation mediated by photoiniferters (PIMP) is reviewed. Regarding controlled radical polymerization from surfaces, a large section of the paper reviews surface-tethered co-initiators, ATRP initiators, and RAFT agents. In combination with photoinitiators or photoredox catalysts, these compounds are employed for surface initiated photopolymerizations. Moreover, examples for coupled photoacids and photoacid generators are presented. Another large section of the article reviews photocoupling and photoclick techniques. Here, the focus is set on light sensitive groups, such as organic azides, tetrazoles and diazirines, which have proven useful in biochemistry, composite technology and many other fields. Full article
(This article belongs to the Section Polymer Chemistry)
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15 pages, 3378 KiB  
Article
Embedding Photoacids into Polymer Opal Structures: Synergistic Effects on Optical and Stimuli-Responsive Features
by Martin Bitsch, Anna Katharina Boehm, Alexander Grandjean, Gregor Jung and Markus Gallei
Molecules 2021, 26(23), 7350; https://doi.org/10.3390/molecules26237350 - 3 Dec 2021
Cited by 9 | Viewed by 2903
Abstract
Opal films with their vivid structural colors represent a field of tremendous interest and obtained materials offer the possibility for many applications, such as optical sensors or anti-counterfeiting materials. A convenient method for the generation of opal structures relies on the tailored design [...] Read more.
Opal films with their vivid structural colors represent a field of tremendous interest and obtained materials offer the possibility for many applications, such as optical sensors or anti-counterfeiting materials. A convenient method for the generation of opal structures relies on the tailored design of core-interlayer-shell (CIS) particles. Within the present study, elastomeric opal films were combined with stimuli-responsive photoacids to further influence the optical properties of structurally colored materials. Starting from cross-linked polystyrene (PS) core particles featuring a hydroxy-rich and polar soft shell, opal films were prepared by application of the melt-shear organization technique. The photoacid tris(2,2,2-trifluoroethyl) 8-hydroxypyrene-1,3,6-trisulfonate (TFEHTS) could be conveniently incorporated during freeze-drying the particle dispersion and prior to the melt-shear organization. Furthermore, the polar opal matrix featuring hydroxylic moieties enabled excited-state proton transfer (ESPT), which is proved by spectroscopic evaluation. Finally, the influence of the photoacid on the optical properties of the 3-dimensional colloidal crystals were investigated within different experimental conditions. The angle dependence of the emission spectra unambiguously shows the selective suppression of the photoacid’s fluorescence in its deprotonated state. Full article
(This article belongs to the Special Issue Polymeric Photonic Materials)
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32 pages, 14796 KiB  
Review
Crosslinking Strategies for the Microfluidic Production of Microgels
by Minjun Chen, Guido Bolognesi and Goran T. Vladisavljević
Molecules 2021, 26(12), 3752; https://doi.org/10.3390/molecules26123752 - 20 Jun 2021
Cited by 40 | Viewed by 9812
Abstract
This article provides a systematic review of the crosslinking strategies used to produce microgel particles in microfluidic chips. Various ionic crosslinking methods for the gelation of charged polymers are discussed, including external gelation via crosslinkers dissolved or dispersed in the oil phase; internal [...] Read more.
This article provides a systematic review of the crosslinking strategies used to produce microgel particles in microfluidic chips. Various ionic crosslinking methods for the gelation of charged polymers are discussed, including external gelation via crosslinkers dissolved or dispersed in the oil phase; internal gelation methods using crosslinkers added to the dispersed phase in their non-active forms, such as chelating agents, photo-acid generators, sparingly soluble or slowly hydrolyzing compounds, and methods involving competitive ligand exchange; rapid mixing of polymer and crosslinking streams; and merging polymer and crosslinker droplets. Covalent crosslinking methods using enzymatic oxidation of modified biopolymers, photo-polymerization of crosslinkable monomers or polymers, and thiol-ene “click” reactions are also discussed, as well as methods based on the sol−gel transitions of stimuli responsive polymers triggered by pH or temperature change. In addition to homogeneous microgel particles, the production of structurally heterogeneous particles such as composite hydrogel particles entrapping droplet interface bilayers, core−shell particles, organoids, and Janus particles are also discussed. Microfluidics offers the ability to precisely tune the chemical composition, size, shape, surface morphology, and internal structure of microgels by bringing multiple fluid streams in contact in a highly controlled fashion using versatile channel geometries and flow configurations, and allowing for controlled crosslinking. Full article
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15 pages, 5615 KiB  
Article
Dielectric Response Spectroscopy as Means to Investigate Interfacial Effects for Ultra-Thin Film Polymer-Based High NA EUV Lithography
by Joren Severi, Danilo De Simone and Stefan De Gendt
Polymers 2020, 12(12), 2971; https://doi.org/10.3390/polym12122971 - 12 Dec 2020
Cited by 8 | Viewed by 3143
Abstract
Extreme ultra-violet lithography (EUVL) is the leading-edge technology to produce advanced nanoelectronics. The further development of EUVL is heavily based on implementing the so-called high numerical aperture (NA) EUVL, which will enable even smaller pitches up to 8 nm half pitch (HP). In [...] Read more.
Extreme ultra-violet lithography (EUVL) is the leading-edge technology to produce advanced nanoelectronics. The further development of EUVL is heavily based on implementing the so-called high numerical aperture (NA) EUVL, which will enable even smaller pitches up to 8 nm half pitch (HP). In anticipation of this high NA technology, it is crucial to assess the readiness of the current resist materials for the high NA regime to comply with the demanding requirements of resolution, line-edge roughness, and sensitivity (RLS). The achievable tighter pitches require lower film thicknesses for both resist and underlying transfer layers. A concern that is tied to the thinning down is the potential change in resist properties and behavior due to the interaction with the underlayer. To increase the fundamental understanding of ultra-thin films for high NA EUVL, a method to investigate the interplay of reduced film thickness and different patterning-relevant underlayers is developed by looking at the glass transition temperature (Tg) of polymer-based resists. To minimize the ambiguity of the results due to resist additives (i.e., photoacid generator (PAG) and quencher), it was opted to move forward with polymer-only samples, the main component of the resist, at this stage of the investigation. By using dielectric response spectroscopy, the results obtained show that changing the protection group of the polymer, as well as altering the polymer film thickness impacts the dynamics of the polymer mobility, which can be assessed through the Tg of the system. Unexpectedly, changing the underlayer did not result in a clear change in the polymer mobility at the tested film thicknesses. Full article
(This article belongs to the Section Polymer Analysis and Characterization)
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9 pages, 1619 KiB  
Article
X-ray Visualization and Quantification Using Fibrous Color Dosimeter Based on Leuco Dye
by Phu Phong Vo, Hoan Ngoc Doan, Kenji Kinashi, Wataru Sakai, Naoto Tsutsumi and Dai Phu Huynh
Appl. Sci. 2020, 10(11), 3798; https://doi.org/10.3390/app10113798 - 29 May 2020
Cited by 12 | Viewed by 3950
Abstract
A polystyrene (PS)-based fibrous color dosimeter, comprising a color former based on 2-(phenylamino)-6-(dipentylamino)-3-methylspiro[9H-xanthene-9,3′-phthalide] (Black305) fluoran leuco dye and a 2-(4-methoxystyryl)-4,6-bis(trichloromethyl)-1,3,5-triazine (MBTT) photoacid generator, was developed for visual detection of X-ray doses of 15 Gy and higher. The composite fiber was produced [...] Read more.
A polystyrene (PS)-based fibrous color dosimeter, comprising a color former based on 2-(phenylamino)-6-(dipentylamino)-3-methylspiro[9H-xanthene-9,3′-phthalide] (Black305) fluoran leuco dye and a 2-(4-methoxystyryl)-4,6-bis(trichloromethyl)-1,3,5-triazine (MBTT) photoacid generator, was developed for visual detection of X-ray doses of 15 Gy and higher. The composite fiber was produced by using a centrifugal spinning method, and the obtained composite fiber exhibited a stable and uniform morphology with a fiber diameter of 10 μm or less and had sufficient mechanical strength. As an example of practical application, we successfully processed the composite fiber into an apron and clearly and visually confirmed that the color change from yellow to black occurs on the surface of the fabric under X-ray exposure. Full article
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13 pages, 2282 KiB  
Article
Design of Iodonium Salts for UV or Near-UV LEDs for Photoacid Generator and Polymerization Purposes
by Ségolène Villotte, Didier Gigmes, Frédéric Dumur and Jacques Lalevée
Molecules 2020, 25(1), 149; https://doi.org/10.3390/molecules25010149 - 30 Dec 2019
Cited by 58 | Viewed by 7438
Abstract
Iodonium salts are well established photoacid generators, cationic photoinitiators, as well as additives commonly used in photoredox catalytic cycles. However, as a strong limitation, iodonium salts are characterized by low light absorption properties for λ > 300 nm so that these latter cannot [...] Read more.
Iodonium salts are well established photoacid generators, cationic photoinitiators, as well as additives commonly used in photoredox catalytic cycles. However, as a strong limitation, iodonium salts are characterized by low light absorption properties for λ > 300 nm so that these latter cannot be activated with cheap, safe, and eco-friendly near UV or even visible light emitting diodes (LEDs). To overcome this drawback, the covalent linkage of an iodonium salt to a chromophore absorbing at longer wavelength is actively researched. With aim at red-shifting the absorption spectrum of the iodonium salt, the synthesis of new compounds combining within a unique chemical structure both the chromophore (here the naphthalimide scaffold) and the iodonium salt is presented. By mean of this strategy, a polymerization could be initiated at 365 nm with the modified iodonium salts whereas no polymerization could be induced with the benchmark iodonium salt i.e., Speedcure 938 at this specific wavelength. To examine the effect of the counter-anion on the photoinitiating ability of these different salts, five different counter-anions were used. Comparison between the different anions revealed the bis(trifluoromethane)sulfonimide salt to exhibit the best photoinitiating ability in both the free radical polymerization of acrylates and the cationic polymerization of epoxides. To support the experimental results, molecular orbital calculations have been carried out. By theoretical calculations, the initiating species resulting from the photocleavage of the iodonium salts could be determined. The cleavage selectivity and the photochemical reactivity of the new iodoniums are also discussed. Full article
(This article belongs to the Special Issue Recent Advances in Photocatalysts for Polymerization Reaction)
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