Artificial Intelligence for Plasma Processes
A special issue of Processes (ISSN 2227-9717). This special issue belongs to the section "Environmental and Green Processes".
Deadline for manuscript submissions: 25 February 2026 | Viewed by 16
Special Issue Editors
Interests: artificial intelligence; plasma processing; material analysis; fusion applications; large language models; energy
Special Issue Information
Dear Colleagues,
As the industry, energy, and research sectors seek to unlock the full potential of plasma-based technologies—from semiconductor fabrication and surface modification to environmental remediation and advanced propulsion—artificial intelligence (AI) is emerging as a transformative enabler. LLM-guided co-pilots, diagnostics, and analysis are redefining how we design, scale, and operate plasma reactors.
This Special Issue on “Artificial Intelligence for Plasma Processes” invites high-quality contributions that showcase recent advances at the intersection of AI and plasma science/engineering. Topics of interest include, but are not limited to, the following:
- Data-driven and hybrid (physics + ML) models for plasma kinetics, transport, and chemistry;
- AI-enabled plasma diagnostics, tomography, and real-time sensing;
- Autonomous control, optimization, and self-tuning of plasma reactors;
- AI-assisted material analysis and characterization of plasma-synthesized films, coatings, and nanostructures;
- Inverse design and virtual screening of plasma conditions for material synthesis;
- Digital twins for scale-up, health monitoring, and predictive maintenance.
We welcome fundamental studies, applied research, and industrial case studies that demonstrate how AI accelerates innovation in plasma processing. Both original research articles and comprehensive reviews are encouraged.
Dr. Benjamin C. Wang
Prof. Dr. Mark A. Cappelli
Guest Editors
Manuscript Submission Information
Manuscripts should be submitted online at www.mdpi.com by registering and logging in to this website. Once you are registered, click here to go to the submission form. Manuscripts can be submitted until the deadline. All submissions that pass pre-check are peer-reviewed. Accepted papers will be published continuously in the journal (as soon as accepted) and will be listed together on the special issue website. Research articles, review articles as well as short communications are invited. For planned papers, a title and short abstract (about 100 words) can be sent to the Editorial Office for announcement on this website.
Submitted manuscripts should not have been published previously, nor be under consideration for publication elsewhere (except conference proceedings papers). All manuscripts are thoroughly refereed through a single-blind peer-review process. A guide for authors and other relevant information for submission of manuscripts is available on the Instructions for Authors page. Processes is an international peer-reviewed open access monthly journal published by MDPI.
Please visit the Instructions for Authors page before submitting a manuscript. The Article Processing Charge (APC) for publication in this open access journal is 2400 CHF (Swiss Francs). Submitted papers should be well formatted and use good English. Authors may use MDPI's English editing service prior to publication or during author revisions.
Keywords
- artificial intelligence
- plasma processing
- material analysis
- fusion applications
- large language models
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