Next-Generation X-Ray Optical Technologies and Applications
A special issue of Photonics (ISSN 2304-6732).
Deadline for manuscript submissions: 15 February 2026 | Viewed by 60
Special Issue Editors
Interests: X-ray optics design; at-wavelength metrology; X-ray beamline diagnostics; X-ray imaging; pump-probe techniques; ultrafast imaging
Special Issue Information
Dear Colleagues,
The emergence of high-brightness X-ray light sources, including fourth-generation synchrotrons and X-ray free-electron lasers (XFELs), has revolutionized imaging capabilities, enabling unprecedented spatial, temporal, and sensitivity resolutions. These advanced sources empower cutting-edge research in battery materials, magnetic systems, chemical dynamics, and beyond. However, harnessing their full potential demands equally sophisticated X-ray optics and imaging techniques.
Key challenges include the development of high-precision optics capable of handling ultra-intense beams—such as nano-focusing mirrors, diffractive optics for phase/polarization control, and compound refractive lenses—as well as high-resolution imaging methods reaching nanometer or even attometer scales. Addressing these needs requires innovations in the design, fabrication, and characterization of X-ray optics, including reflective mirrors, refractive lens, zone plates, and crystals. These components are critical for achieving high flux efficiency, exceptional resolution, and ultra-sensitive detection in next-generation X-ray experiments.
This Special Issue invites contributions on novel X-ray optical technologies, advanced testing methodologies, and breakthrough imaging techniques for applications in materials science, biology, chemistry, and physics. Topics of interest include, but are not limited to, the following:
- Design and fabrication of X-ray optics, including mirrors, CRLs, diffractive optics, and crystals;
- Optical testing method for high-precision optics, including LTP, interferometer, and optical ptychography;
- X-ray at-wavelength metrology techniques, for example, grating interferometry, speckle tracking, and ptychography;
- X-ray optics system or adaptive optics enabling advanced capabilities such as achromatic imaging, polarization, and phase manipulation;
- X-ray beamline diagnostics techniques for synchrotrons and XFELs, such as wavefront sensing, spectrometer, X-ray energy detection, and beam position motor, among others;
- X-ray 2D/3D imaging techniques and applications for high-resolution and high-sensitivity measurement applications;
- Multi-modal imaging for physics, materials science, and biology, including dark-field imaging, phase imaging, magnetic imaging, and element-wise imaging.
- AI-enhanced X-ray wavefront diagnostics and imaging technologies for high-throughput and high-contrast applications, such as phase contrast imaging, coherent diffraction imaging, and microscopic imaging techniques.
Dr. Zhi Qiao
Dr. Ming Li
Guest Editors
Manuscript Submission Information
Manuscripts should be submitted online at www.mdpi.com by registering and logging in to this website. Once you are registered, click here to go to the submission form. Manuscripts can be submitted until the deadline. All submissions that pass pre-check are peer-reviewed. Accepted papers will be published continuously in the journal (as soon as accepted) and will be listed together on the special issue website. Research articles, review articles as well as short communications are invited. For planned papers, a title and short abstract (about 100 words) can be sent to the Editorial Office for announcement on this website.
Submitted manuscripts should not have been published previously, nor be under consideration for publication elsewhere (except conference proceedings papers). All manuscripts are thoroughly refereed through a single-blind peer-review process. A guide for authors and other relevant information for submission of manuscripts is available on the Instructions for Authors page. Photonics is an international peer-reviewed open access monthly journal published by MDPI.
Please visit the Instructions for Authors page before submitting a manuscript. The Article Processing Charge (APC) for publication in this open access journal is 2400 CHF (Swiss Francs). Submitted papers should be well formatted and use good English. Authors may use MDPI's English editing service prior to publication or during author revisions.
Keywords
- X-ray optics and testing
- X-ray metrology
- X-ray multi-contrast imaging
- AI for science
- free electron lasers
- X-ray beamlines and diagnostics
- high-power lasers
- pump-probe techniques
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