Search for Articles:
Title / Keyword
Author / Affiliation / Email
Journal
Article Type
 
 
Advanced Search
 
Section
Special Issue
Volume
Issue
Number
Page
 
2.6
2.1
Journals
Photonics
Special Issues
Optical Technologies for Measurement and Metrology
share announcement

Optical Technologies for Measurement and Metrology

A special issue of Photonics (ISSN 2304-6732).

Deadline for manuscript submissions: 30 April 2025 | Viewed by 1358

Special Issue Editor

Dr. Shuling Hu

E-Mail Website
Guest Editor
School of Instrumentation and Optoelectronic Engineering, Beihang University, XueYuan Road No.37, HaiDian District, Beijing 100000, China
Interests: optical detection; imaging; and guidance control technology; laser and optoelectronic technology; microwave photonics; electro-optic modulator; photonic chip

Special Issue Information

Dear Colleagues,

As one of the most commonly used technologies today, Optical Technologies for Measurement and Metrology are essential in many optical systems, such as for scientific research, industry manufacturing, medical diagnosis, and metrological applications. They utilize various optical phenomena such as reflection, refraction, scattering, interference, and diffraction to achieve the precise measurements of object shape, size, and surface quality. Their numerous applications are ever increasing due to the unprecedented fabrication accuracy offered by photonic-integration technology, allowing narrower linewidth of the generated laser light.

In such a well-defined embedded setting, the issues of high precision, stability, and flexibility are becoming ever more important and should be taken into account in the design and fabrication of measurement systems. Since the precise control of the relevant parameters, such as work distance and laser intensity, is quite feasible, the knowledge of the dynamical behaviour of measurement devices and their dependence on parameter values can successfully be utilized for optimal design.

This Special Issue aims at presenting original state-of-the-art research articles dealing with precision and stability of Optical Technologies for Measurement and Metrology in a broad sense with special emphasis on their operation in a photonic chip. Specifically, papers are solicited dealing with Optical Technologies for Measurement and Metrology coupled with various kinds of external perturbations, such as delayed feedback, shot noise, temperature changes, etc. Researchers are invited to submit their contributions to this Special Issue. Topics include, but are not limited to, the following:

  • Integrated lasers;
  • Photonic chip;
  • Semiconductor lasers;
  • Dynamics and stability;
  • Narrow linewidth lasers;
  • Feedback-induced dynamics;
  • Integrated measurement technologies;
  • Fibre optic sensing;
  • Frequency combs;
  • Metasurface;
  • Signal modulation/demodulation;
  • Optical systems with diffractive optics;
  • Novel HOE designs and holographic patterning techniques;
  • Modelling of volume diffractive elements;
  • 3D display.

I look forward to receiving your contributions.

Dr. Shuling Hu
Guest Editor

Manuscript Submission Information

Manuscripts should be submitted online at www.mdpi.com by registering and logging in to this website. Once you are registered, click here to go to the submission form. Manuscripts can be submitted until the deadline. All submissions that pass pre-check are peer-reviewed. Accepted papers will be published continuously in the journal (as soon as accepted) and will be listed together on the special issue website. Research articles, review articles as well as short communications are invited. For planned papers, a title and short abstract (about 100 words) can be sent to the Editorial Office for announcement on this website.

Submitted manuscripts should not have been published previously, nor be under consideration for publication elsewhere (except conference proceedings papers). All manuscripts are thoroughly refereed through a single-blind peer-review process. A guide for authors and other relevant information for submission of manuscripts is available on the Instructions for Authors page. Photonics is an international peer-reviewed open access monthly journal published by MDPI.

Please visit the Instructions for Authors page before submitting a manuscript. The Article Processing Charge (APC) for publication in this open access journal is 2400 CHF (Swiss Francs). Submitted papers should be well formatted and use good English. Authors may use MDPI's English editing service prior to publication or during author revisions.

Keywords

  • optical measurement and metrology
  • photonic chip
  • integrated lasers
  • non-contact measurement
  • metasurface
  • signal modulation/demodulation
  • 3D display

Benefits of Publishing in a Special Issue

  • Ease of navigation: Grouping papers by topic helps scholars navigate broad scope journals more efficiently.
  • Greater discoverability: Special Issues support the reach and impact of scientific research. Articles in Special Issues are more discoverable and cited more frequently.
  • Expansion of research network: Special Issues facilitate connections among authors, fostering scientific collaborations.
  • External promotion: Articles in Special Issues are often promoted through the journal's social media, increasing their visibility.
  • e-Book format: Special Issues with more than 10 articles can be published as dedicated e-books, ensuring wide and rapid dissemination.

Further information on MDPI's Special Issue polices can be found here.

Published Papers (2 papers)

Download All Papers
Order results
Result details
Show export options expand_more Show export options expand_less
Select all
Export citation of selected articles as:

Research

13 pages, 13317 KiB  
Article
Toward Single-Shot Real-Time Spectroscopy of Dynamic Materials via White-Light and Supercontinuum Light Sources
by Zhanibek Bolatbek and Imad Agha
Photonics 2024, 11(12), 1119; https://doi.org/10.3390/photonics11121119 - 26 Nov 2024
Viewed by 426
Abstract
In conventional camera or monochromator-based spectroscopy, different wavelengths, spanning from short ultraviolet region to long infrared region, are calculated under steady-state conditions due to the temporally multiplexed nature of conventional CMOS/CCD-equipped spectrometers, which limit the refresh rates to the order of milliseconds for [...] Read more.
In conventional camera or monochromator-based spectroscopy, different wavelengths, spanning from short ultraviolet region to long infrared region, are calculated under steady-state conditions due to the temporally multiplexed nature of conventional CMOS/CCD-equipped spectrometers, which limit the refresh rates to the order of milliseconds for most tools available on the market. These refresh rates might not be suitable for most temporally dynamic effects that govern the behavior of disparate effects, such as phase transition in phase-change materials, conformal changes in molecules, and microbial community evolution, among others. Pump-probe methods are often presented as a solution to the capture speed limitation, but in themselves are not applicable universally and are not truly “real-time”. In this work, we present an evolution to the conventional spectrometers, increasing its speed by over 4 orders of magnitude while maintaining reasonable spectral resolution. We additionally present a path that combines our technique with supercontinuum light sources for even more ambitious future applications. Full article
(This article belongs to the Special Issue Optical Technologies for Measurement and Metrology)
►▼ Show Figures

Figure 1

14 pages, 11363 KiB  
Article
Adaptive Threshold Algorithm for Outlier Elimination in 3D Topography Data of Metal Additive Manufactured Surfaces Obtained from Focus Variation Microscopy
by Xin Xu, Tobias Pahl, Sebastian Hagemeier and Peter Lehmann
Photonics 2024, 11(11), 1011; https://doi.org/10.3390/photonics11111011 - 26 Oct 2024
Viewed by 638
Abstract
The topography of surfaces produced by metal additive manufacturing is a challenge for optical measurement systems such as focus variation microscopes. These irregularities can lead to artifacts, such as incorrectly measured protrusions or spikes, hampering reliable topographic characterization. In order to eliminate this [...] Read more.
The topography of surfaces produced by metal additive manufacturing is a challenge for optical measurement systems such as focus variation microscopes. These irregularities can lead to artifacts, such as incorrectly measured protrusions or spikes, hampering reliable topographic characterization. In order to eliminate this problem, we introduce a new algorithm based on dual convolving a vertical Sobel operator with cross sections of an image stack parallel to the scanning direction of the so-called depth scan. This has proven beneficial in order to distinguish the focus region from out-of-focus areas where outliers are frequently detected. This paper introduces a method for deriving self-adaptive thresholds from the convolution result and compares the effects of different operators in creating self-adaptive thresholds. Additionally, a simulation model of focus variation microscopy is introduced to validate both the measuring system and the proposed algorithm, thereby enhancing the overall performance of focus variation microscopy. Finally, comparisons of measurement results on rough metal additive manufacturing workpieces with and without self-adaptive thresholds are discussed to demonstrate the algorithm’s effectiveness.The utilization of self-adaptive thresholds demonstrably reduces the uncertainty range in roughness parameter calculations. For example, in the case of an additive manufactured metal sample due to outlier elimination, the Sz roughness value reduces from 543 µm to 413 µm. Full article
(This article belongs to the Special Issue Optical Technologies for Measurement and Metrology)
►▼ Show Figures

Figure 1

Show export options expand_more Show export options expand_less
Select all
Export citation of selected articles as:
 
Displaying articles 1-2
Back to TopTop