Nanoimprint Lithography Technology and Applications

Dear Colleagues,

Nanoimprinting and nanoimprint lithography have evolved tremendously since their beginnings in the mid-1990’s, and have had an impact on a wide application field, ranging from optics to life sciences, from organic electronics to photovoltaics. Today, we find nanoimprint processes in research as well as in industry, and the number of applications is growing constantly.

The variety of processes, materials, and applications is huge, and a sign of the enormous flexibility of the process, which allows for many different requirements to be fulfilled. There are processes working on full wafer-scale or even on display panel size or on curved surfaces. There are nanoimprint tools working in a step-and-repeat way and there are roll-to-roll or roll-to-plate processes. The nanoimprint processes can be based on light-curing materials, thermally curing materials, thermoplastic materials or can be material transfer processes like, for example, microcontact printing processes. Nanoimprint materials range from classical resists for pattern transfer processes like reactive ion etching, to permanent materials for optical or biological applications. Along with the different processes and material requirements come different stamp concepts and stamp materials.

All of this makes nanoimprinting a very versatile process and a fascinating and diverse field of R&D.

This Special Issue of Nanomaterials will attempt to cover the most recent advances and the state-of-the-art in the field of nanoimprinting and nanoimprint lithography as far as the processes, tools, materials, and applications are concerned. Contributions ranging from basic research to industrial applications will be considered. Papers dealing with applications addressing societal challenges like climate change are highly welcome.

Dr. Michael Mühlberger
Guest Editor

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