Advanced Nanofabrication and Nanolithography
A special issue of Nanomaterials (ISSN 2079-4991). This special issue belongs to the section "Nanophotonics Materials and Devices".
Deadline for manuscript submissions: 30 April 2026 | Viewed by 73
Special Issue Editor
Special Issue Information
Dear Colleagues,
The continuous advancement of nanotechnology relies heavily on the development of high-precision, high-throughput, and cost-effective nanofabrication techniques. In recent years, the rapid evolution of nanolithography—from optical and electron-beam lithography to maskless and hybrid multiphoton direct writing—has significantly expanded the capability to manipulate matter at the nanoscale. Meanwhile, emerging nanofabrication approaches such as plasmonic lithography, nanoimprint, atomic layer etching, and self-assembly have demonstrated remarkable potential for fabricating functional nanostructures with unprecedented resolution and complexity.
This Special Issue on “Advanced Nanofabrication and Nanolithography” aims to gather original research articles, communications, and comprehensive reviews that present the latest advances in nanoscale patterning, material processing, and device integration. Topics of interest include, but are not limited to, next-generation lithographic technologies, nanoscale additive manufacturing, hybrid optical–electronic nanofabrication, and applications in photonics, electronics, energy, and bioengineering. Through this Special Issue, we hope to foster cross-disciplinary collaboration and inspire new strategies for scalable, precise, and intelligent nanomanufacturing.
Dr. Yuanyuan Zhao
Guest Editor
Manuscript Submission Information
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Keywords
- nanofabrication
- nanolithography
- direct laser writing
- maskless lithography
- nanoimprint and self-assembly
- plasmonic and near-field lithography
- metamaterials and metasurfaces
- micro-/nano-optics
- 3D nanoprinting
- nanodevices and functional materials
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