Recent and Future Trends in Surface Topography Metrology
A special issue of Metrology (ISSN 2673-8244).
Deadline for manuscript submissions: 25 November 2026 | Viewed by 121
Editors
Interests: topography analysis; nanometrology; coordinate measurement technique; optical scanning; photogrammetry; reverse engineering; computed tomography
Special Issues, Collections and Topics in MDPI journals
Interests: multiscale analysis; additive manufacturing; non-traditional manufacturing; microtexturing; surface metrology; surface integrity
Special Issues, Collections and Topics in MDPI journals
Interests: axiomatic design; surface metrology; sports engineering
Special Issues, Collections and Topics in MDPI journals
Interests: surface topography; roughness; morphology; surface functionalities; surface structurations
Interests: surface topography; multiscale analysis; fractal dimension; heritage
Special Issue Information
Dear Colleagues,
Surface metrology is evolving rapidly, driven by advances in optical and tactile instrumentation, multi-sensor measurement, in-line/on-machine inspection, and data-centric workflows. At the same time, the community faces persistent challenges in traceability, uncertainty evaluation, comparability across modalities, and reproducibility of data processing pipelines.
This Special Issue, “Recent and Future Trends in Surface Topography Metrology”, welcomes contributions that review recent progress and propose future directions for reliable surface topography measurement across scales (micro–nano to macro). Topics include, but are not limited to: calibration strategies and reference artefacts; uncertainty characterization and method validation; cross-modality comparison and data fusion; the metrological impact of filtering, segmentation, and parameterization (e.g., ISO standards for parameters); functional surface assessment linking measurement to performance; and emerging approaches such as AI-assisted processing, in-process monitoring, and digital/FAIR data practices. We encourage high-quality review papers, perspectives/roadmaps, and original research articles that include benchmarking, best-practice recommendations, and clear reporting of metrological quality.
Prof. Dr. Michal Wieczorowski
Dr. Tomasz Bartkowiak
Prof. Dr. Chris Brown
Prof. Dr. Maxence Bigerelle
Guest Editors
Dr. François Berkmans
Guest Editor Assistant
Manuscript Submission Information
Manuscripts should be submitted online at www.mdpi.com by registering and logging in to this website. Once you are registered, click here to go to the submission form. Manuscripts can be submitted until the deadline. All submissions that pass pre-check are peer-reviewed. Accepted papers will be published continuously in the journal (as soon as accepted) and will be listed together on the special issue website. Research articles, review articles as well as short communications are invited. For planned papers, a title and short abstract (about 250 words) can be sent to the Editorial Office for assessment.
Submitted manuscripts should not have been published previously, nor be under consideration for publication elsewhere (except conference proceedings papers). All manuscripts are thoroughly refereed through a single-anonymized peer-review process. A guide for authors and other relevant information for submission of manuscripts is available on the Instructions for Authors page. Metrology is an international peer-reviewed open access quarterly journal published by MDPI.
Please visit the Instructions for Authors page before submitting a manuscript. The Article Processing Charge (APC) for publication in this open access journal is 1200 CHF (Swiss Francs). Submitted papers should be well formatted and use good English. Authors may use MDPI's English editing service prior to publication or during author revisions.
Keywords
- surface metrology
- surface topography
- areal parameters
- traceability
- calibration
- measurement uncertainty
- reference artefacts
- filtering
- multi-scale analysis
- in-line metrology
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