Infrared Microscopic Imaging Technologies in Materials Science
A special issue of Materials (ISSN 1996-1944). This special issue belongs to the section "Advanced Materials Characterization".
Deadline for manuscript submissions: 20 February 2026 | Viewed by 111
Special Issue Editor
2. Beijing Institute of Technology, Zhuhai, No. 6 Jinfeng Road, Tangjiawan, Zhuhai 519088, China
Interests: infrared imaging; image processing; infrared spectroscopy
Special Issue Information
Dear Colleagues,
Advanced infrared sensing technologies in materials science play a crucial role in various fields such as materials characterization, analysis, and quality control. By utilizing infrared radiation, researchers can gain valuable insights into the structure, composition, and properties of materials.
The current research in this area focuses on improving the sensitivity, accuracy, and resolution of infrared sensing technologies to better capture and analyze the complex properties of materials. However, researchers are facing challenges such as improving signal-to-noise ratios, enhancing spatial resolution, and reducing measurement artifacts.
Overcoming these hurdles is essential for advancing our understanding of materials at a molecular level and developing innovative materials with tailored properties for a wide range of applications. By addressing these challenges, scientists can unlock new opportunities in materials science and pave the way for groundbreaking discoveries in various industries.
Dr. Lingxue Wang
Guest Editor
Manuscript Submission Information
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Keywords
- infrared sensing technology
- materials science
- materials characterization
- infrared microscopic imaging
- sensitivity
- signal-to-noise ratio
- spatial resolution
- beyond diffraction limit
- molecular level
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