Magnetic, Optical Properties of Thin Films

A special issue of Coatings (ISSN 2079-6412). This special issue belongs to the section "Thin Films".

Deadline for manuscript submissions: closed (30 April 2022) | Viewed by 2992

Special Issue Editor


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Guest Editor
National Institute for Laser, Plasma and Radiation Physics, 077125 Magurele, Romania
Interests: thin films; nanomaterials; coatings; magnetron sputtering; PVD; PLD; sol–gel spin coating; nanostructures; plasmonics; opals; photonic crystals; optical glasses; magneto-optical materials; vitreous and crystalline materials as bulk and thin films for lasers; biocomposites; new materials for optoelectronics and agriculture; melt quenching; structural characterization and properties of vitreous and glass ceramic materials; quartz glass; special refractories; advanced purity materials; UV-Vis; FTIR; Raman; SEM-EDX; AFM
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Special Issue Information

Dear Colleagues,

Thin films represent a new scientific domain. They comprise many types of layers, generally as coatings. The thickness of these layers is variable, ranging from several nanometers to few micrometers. A new category of films can be called the “very thin films”, which have thickness under 1000 Angstroms for organic polymeric films and under 10 Angstroms for inorganic films. Thin films not only improve the properties of substrates but introduce many new and interesting properties, such as optical, magnetic, mechanical, electrical, thermal, or even biological. Thin films with optical, magnetic, and magneto-optical properties are of special interest due to their very interesting and useful applications in lasers, optoelectronics, spatial sciences, and medicine, as amplifiers, mirrors, waveguides, resonant cavities, selectors, etc.

The methods for the deposition of thin films are generally separated into physical and chemical approaches. The main physical methods include thermal evaporation, pulsed laser deposition, molecular epitaxy, and magnetron sputtering; sol–gel, precipitation, pyrolysis, chemical vapor deposition, and electroplating represent some of the chemical methods. Some new methods, such as matrix-assisted pulsed laser evaporation (MAPLE), can be referred to as physico-chemical methods because they include both physical and chemical reactions.

Thin films’ structure and properties can be evaluated by techniques such as atomic force microscopy (AFM), scanning electron microscopy (SEM) coupled with energy-dispersive X-ray (EDX or EDS) analysis, transmission electron microscopy (TEM), UV-Vis-IR and Raman spectroscopy, X-ray diffraction (XRD) analysis, or X-ray photoelectron spectroscopy (XPS).

Potential topics in this summary:

  • Organic-inorganic optical thin films
  • Magneto-optical thin films with high Verdet constant
  • Variable optics in multilayered thin films
  • The enhancement of magneto-optical properties induced by nano-crystallization in thin films
  • Sol–gel deposition of rare-earth-doped thin films
  • Magnetron sputtering versus pulsed laser deposition for multicomponent thin films
  • New giant magnetoresistant thin films
  • Multilayer thin film properties design and modelling

Dr. Bogdan Alexandru Sava
Guest Editor

Manuscript Submission Information

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Submitted manuscripts should not have been published previously, nor be under consideration for publication elsewhere (except conference proceedings papers). All manuscripts are thoroughly refereed through a single-blind peer-review process. A guide for authors and other relevant information for submission of manuscripts is available on the Instructions for Authors page. Coatings is an international peer-reviewed open access monthly journal published by MDPI.

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Keywords

  • thin films
  • optical properties
  • magnetic properties
  • faraday rotation
  • laser guides

Published Papers (1 paper)

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Research

12 pages, 5741 KiB  
Article
Characterization of V2O3 Nanoscale Thin Films Prepared by DC Magnetron Sputtering Technique
by Ivan Castillo, Karuna Kara Mishra and Ram S. Katiyar
Coatings 2022, 12(5), 649; https://doi.org/10.3390/coatings12050649 - 10 May 2022
Cited by 3 | Viewed by 2391
Abstract
Vanadium sesquioxide V2O3, a transition metal oxide, is an important metal transition insulator due to its potential applications in novel electronic and memory devices. V2O3 thin films of thickness around 230 nm were grown on Si/SiO [...] Read more.
Vanadium sesquioxide V2O3, a transition metal oxide, is an important metal transition insulator due to its potential applications in novel electronic and memory devices. V2O3 thin films of thickness around 230 nm were grown on Si/SiO2/Ti/Pt substrates at deposition temperature of 723 K in a controlled Ar:O2 atmosphere of 35:2.5 sccm employing Direct Current (DC) magnetron sputtering. X-ray diffraction studies confirmed single phase of the material stabilized in corundum rhombohedral R3¯C phase. X-ray photoelectron spectroscopic results revealed chemical oxidation states are of V3+ and O2− and have nearly stochiometric elemental compositions in the films. Magnetization studies down to 10 K predicts a canted antiferromagnetic transition around 55 K. Out of 7 expected Raman active modes (2A1g + 5Eg), two A1g Raman active modes at 242 and 500 cm−1 were observed at ambient R3¯C phase. Temperature dependent Raman spectroscopic studies carried out from 80 to 300 K identified a monoclinic to rhombohedral phase transition at ~143 K. Full article
(This article belongs to the Special Issue Magnetic, Optical Properties of Thin Films)
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