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Journal: Plasma, 2024
Volume: 7
Number: 15

Article: About the Data Analysis of Optical Emission Spectra of Reactive Ion Etching Processes—The Method of Spectral Redundancy Reduction
Authors: by Micha Haase, Mudassir Ali Sayyed, Jan Langer, Danny Reuter and Harald Kuhn
Link: https://www.mdpi.com/2571-6182/7/1/15

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