Li, L.; Xiao, Y.; Wang, W.; Guan, C.; Yao, W.; Zhang, Y.; Chen, X.; Wan, Q.; Dong, C.; Xu, X.
Advanced Fabrication of 56 Gbaud Electro-Absorption Modulated Laser (EML) Chips Integrated with High-Speed Silicon Photonic Substrates. Photonics 2025, 12, 329.
https://doi.org/10.3390/photonics12040329
AMA Style
Li L, Xiao Y, Wang W, Guan C, Yao W, Zhang Y, Chen X, Wan Q, Dong C, Xu X.
Advanced Fabrication of 56 Gbaud Electro-Absorption Modulated Laser (EML) Chips Integrated with High-Speed Silicon Photonic Substrates. Photonics. 2025; 12(4):329.
https://doi.org/10.3390/photonics12040329
Chicago/Turabian Style
Li, Liang, Yifan Xiao, Weiqi Wang, Chenggang Guan, Wengang Yao, Yuming Zhang, Xuan Chen, Qiang Wan, Chaoqiang Dong, and Xinyuan Xu.
2025. "Advanced Fabrication of 56 Gbaud Electro-Absorption Modulated Laser (EML) Chips Integrated with High-Speed Silicon Photonic Substrates" Photonics 12, no. 4: 329.
https://doi.org/10.3390/photonics12040329
APA Style
Li, L., Xiao, Y., Wang, W., Guan, C., Yao, W., Zhang, Y., Chen, X., Wan, Q., Dong, C., & Xu, X.
(2025). Advanced Fabrication of 56 Gbaud Electro-Absorption Modulated Laser (EML) Chips Integrated with High-Speed Silicon Photonic Substrates. Photonics, 12(4), 329.
https://doi.org/10.3390/photonics12040329
