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Journal: Processes, 2024
Volume: 12
Number: 1941
1941
Article: Mechanism of Improving Etching Selectivity for E-Beam Resist AR-N 7520 in the Formation of Photonic Silicon Structures
Authors: by Ksenia Fetisenkova, Alexander Melnikov, Vitaly Kuzmenko, Andrey Miakonkikh, Alexander Rogozhin, Andrey Tatarintsev, Oleg Glaz and Vsevolod Kiselevsky
Link: https://www.mdpi.com/2227-9717/12/9/1941

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