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Chen C-W, Wang S-J, Hsieh W-C, Chen J-M, Jong T, Lan W-H, Wang M-C. Q-Factor Performance of 28 nm-Node High-K Gate Dielectric under DPN Treatment at Different Annealing Temperatures. Electronics. 2020; 9(12):2086. https://doi.org/10.3390/electronics9122086

Chen, Chii-Wen, Shea-Jue Wang, Wen-Ching Hsieh, Jian-Ming Chen, Te Jong, Wen-How Lan, and Mu-Chun Wang. 2020. "Q-Factor Performance of 28 nm-Node High-K Gate Dielectric under DPN Treatment at Different Annealing Temperatures" Electronics 9, no. 12: 2086. https://doi.org/10.3390/electronics9122086

Chen, C.-W., Wang, S.-J., Hsieh, W.-C., Chen, J.-M., Jong, T., Lan, W.-H., & Wang, M.-C. (2020). Q-Factor Performance of 28 nm-Node High-K Gate Dielectric under DPN Treatment at Different Annealing Temperatures. Electronics, 9(12), 2086. https://doi.org/10.3390/electronics9122086