Chen, Y.-N.; Chen, C.-J.; Fan, M.-L.; Hu, V.P.-H.; Su, P.; Chuang, C.-T.
Impacts of Work Function Variation and Line-Edge Roughness on TFET and FinFET Devices and 32-Bit CLA Circuits. J. Low Power Electron. Appl. 2015, 5, 101-115.
https://doi.org/10.3390/jlpea5020101
AMA Style
Chen Y-N, Chen C-J, Fan M-L, Hu VP-H, Su P, Chuang C-T.
Impacts of Work Function Variation and Line-Edge Roughness on TFET and FinFET Devices and 32-Bit CLA Circuits. Journal of Low Power Electronics and Applications. 2015; 5(2):101-115.
https://doi.org/10.3390/jlpea5020101
Chicago/Turabian Style
Chen, Yin-Nien, Chien-Ju Chen, Ming-Long Fan, Vita Pi-Ho Hu, Pin Su, and Ching-Te Chuang.
2015. "Impacts of Work Function Variation and Line-Edge Roughness on TFET and FinFET Devices and 32-Bit CLA Circuits" Journal of Low Power Electronics and Applications 5, no. 2: 101-115.
https://doi.org/10.3390/jlpea5020101
APA Style
Chen, Y.-N., Chen, C.-J., Fan, M.-L., Hu, V. P.-H., Su, P., & Chuang, C.-T.
(2015). Impacts of Work Function Variation and Line-Edge Roughness on TFET and FinFET Devices and 32-Bit CLA Circuits. Journal of Low Power Electronics and Applications, 5(2), 101-115.
https://doi.org/10.3390/jlpea5020101
