Orozco-Hernandez, G.; Olaya-Flórez, J.J.; Alfonso-Orjuela, J.E.; Pineda-Hernandez, D.A.; Restrepo-Parra, E.
Effect of Gas Flow Ratio on the Chemical and Electrochemical Properties of Bismuth-Oxygen Films Deposited in Reactive Phase Sputtering. Coatings 2024, 14, 896.
https://doi.org/10.3390/coatings14070896
AMA Style
Orozco-Hernandez G, Olaya-Flórez JJ, Alfonso-Orjuela JE, Pineda-Hernandez DA, Restrepo-Parra E.
Effect of Gas Flow Ratio on the Chemical and Electrochemical Properties of Bismuth-Oxygen Films Deposited in Reactive Phase Sputtering. Coatings. 2024; 14(7):896.
https://doi.org/10.3390/coatings14070896
Chicago/Turabian Style
Orozco-Hernandez, Giovany, Jhon Jairo Olaya-Flórez, Jose Edgar Alfonso-Orjuela, Daniel Alejandro Pineda-Hernandez, and Elisabeth Restrepo-Parra.
2024. "Effect of Gas Flow Ratio on the Chemical and Electrochemical Properties of Bismuth-Oxygen Films Deposited in Reactive Phase Sputtering" Coatings 14, no. 7: 896.
https://doi.org/10.3390/coatings14070896
APA Style
Orozco-Hernandez, G., Olaya-Flórez, J. J., Alfonso-Orjuela, J. E., Pineda-Hernandez, D. A., & Restrepo-Parra, E.
(2024). Effect of Gas Flow Ratio on the Chemical and Electrochemical Properties of Bismuth-Oxygen Films Deposited in Reactive Phase Sputtering. Coatings, 14(7), 896.
https://doi.org/10.3390/coatings14070896
