Baker, A.A.; Engwall, A.M.; Bayu-Aji, L.B.; Bae, J.H.; Shin, S.J.; Moody, J.D.; Kucheyev, S.O.
Tantalum Suboxide Films with Tunable Composition and Electrical Resistivity Deposited by Reactive Magnetron Sputtering. Coatings 2022, 12, 917.
https://doi.org/10.3390/coatings12070917
AMA Style
Baker AA, Engwall AM, Bayu-Aji LB, Bae JH, Shin SJ, Moody JD, Kucheyev SO.
Tantalum Suboxide Films with Tunable Composition and Electrical Resistivity Deposited by Reactive Magnetron Sputtering. Coatings. 2022; 12(7):917.
https://doi.org/10.3390/coatings12070917
Chicago/Turabian Style
Baker, Alexander A., Alison M. Engwall, Leonardus Bimo Bayu-Aji, John H. Bae, Swanee J. Shin, John D. Moody, and Sergei O. Kucheyev.
2022. "Tantalum Suboxide Films with Tunable Composition and Electrical Resistivity Deposited by Reactive Magnetron Sputtering" Coatings 12, no. 7: 917.
https://doi.org/10.3390/coatings12070917
APA Style
Baker, A. A., Engwall, A. M., Bayu-Aji, L. B., Bae, J. H., Shin, S. J., Moody, J. D., & Kucheyev, S. O.
(2022). Tantalum Suboxide Films with Tunable Composition and Electrical Resistivity Deposited by Reactive Magnetron Sputtering. Coatings, 12(7), 917.
https://doi.org/10.3390/coatings12070917