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Enhancement of Cleanliness and Deposition Rate by Understanding the Multiple Roles of the Showerhead Electrode in a Capacitively Coupled Plasma Reactor
 
 

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Journal: Coatings, 2021
Volume: 11
Number: 1004

Article: Computational Fluid Dynamics Analysis of Particle Deposition Induced by a Showerhead Electrode in a Capacitively Coupled Plasma Reactor
Authors: by Ho Jun Kim and Jung Hwan Yoon
Link: https://www.mdpi.com/2079-6412/11/8/1004

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