Cui, Y.; Wang, X.; Zhang, C.; Wang, J.; Shi, Z.
Numerical Investigation for the Resin Filling Behavior during Ultraviolet Nanoimprint Lithography of Subwavelength Moth-Eye Nanostructure. Coatings 2021, 11, 799.
https://doi.org/10.3390/coatings11070799
AMA Style
Cui Y, Wang X, Zhang C, Wang J, Shi Z.
Numerical Investigation for the Resin Filling Behavior during Ultraviolet Nanoimprint Lithography of Subwavelength Moth-Eye Nanostructure. Coatings. 2021; 11(7):799.
https://doi.org/10.3390/coatings11070799
Chicago/Turabian Style
Cui, Yuanchi, Xuewen Wang, Chengpeng Zhang, Jilai Wang, and Zhenyu Shi.
2021. "Numerical Investigation for the Resin Filling Behavior during Ultraviolet Nanoimprint Lithography of Subwavelength Moth-Eye Nanostructure" Coatings 11, no. 7: 799.
https://doi.org/10.3390/coatings11070799
APA Style
Cui, Y., Wang, X., Zhang, C., Wang, J., & Shi, Z.
(2021). Numerical Investigation for the Resin Filling Behavior during Ultraviolet Nanoimprint Lithography of Subwavelength Moth-Eye Nanostructure. Coatings, 11(7), 799.
https://doi.org/10.3390/coatings11070799