Zhang, Y.; Wang, Y.; Wang, S.; Wei, W.; Ge, X.; Zhu, B.; Shao, J.; Wang, Y.
Comparison of Carbon Thin Films with Low Secondary Electron Yield Deposited in Neon and Argon. Coatings 2020, 10, 884.
https://doi.org/10.3390/coatings10090884
AMA Style
Zhang Y, Wang Y, Wang S, Wei W, Ge X, Zhu B, Shao J, Wang Y.
Comparison of Carbon Thin Films with Low Secondary Electron Yield Deposited in Neon and Argon. Coatings. 2020; 10(9):884.
https://doi.org/10.3390/coatings10090884
Chicago/Turabian Style
Zhang, Yuxin, Yigang Wang, Sihui Wang, Wei Wei, Xiaoqin Ge, Bangle Zhu, Jieqiong Shao, and Yong Wang.
2020. "Comparison of Carbon Thin Films with Low Secondary Electron Yield Deposited in Neon and Argon" Coatings 10, no. 9: 884.
https://doi.org/10.3390/coatings10090884
APA Style
Zhang, Y., Wang, Y., Wang, S., Wei, W., Ge, X., Zhu, B., Shao, J., & Wang, Y.
(2020). Comparison of Carbon Thin Films with Low Secondary Electron Yield Deposited in Neon and Argon. Coatings, 10(9), 884.
https://doi.org/10.3390/coatings10090884