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Journal: Coatings, 2020
Volume: 10
Number: 637

Article: Plasma Etching Behavior of SF6 Plasma Pre-Treatment Sputter-Deposited Yttrium Oxide Films
Authors: by Wei-Kai Wang, Sung-Yu Wang, Kuo-Feng Liu, Pi-Chuen Tsai, Yu-Hao Zhang and Shih-Yung Huang
Link: https://www.mdpi.com/2079-6412/10/7/637

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