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Open AccessArticle

Plasma Etching Behavior of SF6 Plasma Pre-Treatment Sputter-Deposited Yttrium Oxide Films

1
Department of Materials Science and Engineering, Da-Yeh University, Changhua 51591, Taiwan
2
Graduate Institute of Materials Science and Green Energy Engineering, National Formosa University, Huwei, Yunlin 632, Taiwan
3
Department of Industrial Engineering and Management, Da-Yeh University, Changhua 51591, Taiwan
*
Author to whom correspondence should be addressed.
Coatings 2020, 10(7), 637; https://doi.org/10.3390/coatings10070637
Received: 9 June 2020 / Revised: 25 June 2020 / Accepted: 28 June 2020 / Published: 30 June 2020
(This article belongs to the Section Corrosion, Wear and Erosion)
Yttrium oxyfluoride (YOF) protective materials were fabricated on sputter-deposited yttrium oxide (Y2O3) by high-density (sulfur fluoride) SF6 plasma irradiation. The structures, compositions, and fluorocarbon-plasma etching behaviors of these films were systematically characterized by various techniques. After exposure to SF6 plasma, the Y2O3 film surface was fluorinated significantly to form a YOF film with an approximate average thickness of 30 nm. X-ray photoelectron spectroscopy revealed few changes in the elemental and chemical compositions of the surface layer after fluorination, confirming the chemical stability of the YOF/Y2O3 sample. Transmission electron microscopy confirmed a complete lattice pattern on the YOF/Y2O3 structure after fluorocarbon plasma exposure. These results indicate that the SF6 plasma-treated Y2O3 film is more erosion resistant than the commercial Y2O3 coating, and thus accumulates fewer contamination particles. View Full-Text
Keywords: yttrium oxyfluoride; yttrium oxide; SF6 plasma treatment yttrium oxyfluoride; yttrium oxide; SF6 plasma treatment
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Wang, W.-K.; Wang, S.-Y.; Liu, K.-F.; Tsai, P.-C.; Zhang, Y.-H.; Huang, S.-Y. Plasma Etching Behavior of SF6 Plasma Pre-Treatment Sputter-Deposited Yttrium Oxide Films. Coatings 2020, 10, 637.

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