Ren, H.-T.; Han, J.; Li, T.-T.; Lin, Q.; Lin, J.-H.; Lou, C.-W.
Oxalic Acid-Induced Photodissolution of Ferrihydrite and the Fate of Loaded As(V): Kinetics and Mechanism. Nanomaterials 2019, 9, 1143.
https://doi.org/10.3390/nano9081143
AMA Style
Ren H-T, Han J, Li T-T, Lin Q, Lin J-H, Lou C-W.
Oxalic Acid-Induced Photodissolution of Ferrihydrite and the Fate of Loaded As(V): Kinetics and Mechanism. Nanomaterials. 2019; 9(8):1143.
https://doi.org/10.3390/nano9081143
Chicago/Turabian Style
Ren, Hai-Tao, Jing Han, Ting-Ting Li, Qi Lin, Jia-Horng Lin, and Ching-Wen Lou.
2019. "Oxalic Acid-Induced Photodissolution of Ferrihydrite and the Fate of Loaded As(V): Kinetics and Mechanism" Nanomaterials 9, no. 8: 1143.
https://doi.org/10.3390/nano9081143
APA Style
Ren, H.-T., Han, J., Li, T.-T., Lin, Q., Lin, J.-H., & Lou, C.-W.
(2019). Oxalic Acid-Induced Photodissolution of Ferrihydrite and the Fate of Loaded As(V): Kinetics and Mechanism. Nanomaterials, 9(8), 1143.
https://doi.org/10.3390/nano9081143