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Oxalic Acid-Induced Photodissolution of Ferrihydrite and the Fate of Loaded As(V): Kinetics and Mechanism

1,2,3, 1, 1,2, 4,*, 1,3,5,6,7,8,9,* and 3,7,8,10,11,*
1
Innovation Platform of Intelligent and Energy-Saving Textiles, School of Textile Science and Engineering, Tianjin Polytechnic University, Tianjin 300387, China
2
Tianjin and Ministry of Education Key Laboratory for Advanced Textile Composite Materials, Tianjin Polytechnic University, Tianjin 300387, China
3
Fujian Key Laboratory of Novel Functional Fibers and Materials, Minjiang University, Fuzhou 350108, China
4
Fujian Engineering Research Center of New Chinese Lacquer Material, Minjiang University, Fuzhou 350108, China
5
School of Chinese Medicine, China Medical University, Taichung 40402, Taiwan
6
Laboratory of Fiber Application and Manufacturing, Department of Fiber and Composite Materials, Feng Chia University, Taichung 40724, Taiwan
7
Ocean College, Minjiang University, Fuzhou 350108, China
8
College of Textile and Clothing, Qingdao University, Qingdao 266071, China
9
Department of Fashion Design, Asia University, Taichung 41354, Taiwan
10
Department of Bioinformatics and Medical Engineering, Asia University, Taichung 41354, Taiwan
11
Department of Medical Research, China Medical University Hospital, China Medical University, Taichung 40402, Taiwan
*
Authors to whom correspondence should be addressed.
Nanomaterials 2019, 9(8), 1143; https://doi.org/10.3390/nano9081143
Received: 2 July 2019 / Revised: 1 August 2019 / Accepted: 6 August 2019 / Published: 9 August 2019
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PDF [3787 KB, uploaded 9 August 2019]
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Abstract

The fate of arsenic in the water environment is of great concern. Here, the influences of oxalic acid and UV light illumination on the dissolution of naked ferrihydrite (Fhy), Fhy loaded with As(V) [Fhy*-As(V)], as well as the fate of As(V) at pH 3.0 were studied. With the assistance of oxalic acid, complexes of Fe(III)-oxalic acid produced on Fhy/Fhy*-As(V) were reduced to Fe(II)-oxalic acid by photo-induced electrons under UV light irradiation. UV light has nearly no impact on the release of As(V) in the system of Fhy*-As(V) without the assistance of oxalic acid. Nevertheless, in the existence of oxalic acid, UV light illumination resulted in the contents of liberated As(V) decreased by 775–1300% compared to that without light. Considering the coexistence of As(V), oxalic acid as well as iron oxides in aquatic environments, the present study revealed that UV illumination could enhance the retention of As(V) on Fhy in the acidic water environment containing oxalic acid. View Full-Text
Keywords: ferrihydrite; As(V); photodissolution; oxalic acid; fate ferrihydrite; As(V); photodissolution; oxalic acid; fate
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This is an open access article distributed under the Creative Commons Attribution License which permits unrestricted use, distribution, and reproduction in any medium, provided the original work is properly cited (CC BY 4.0).
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Ren, H.-T.; Han, J.; Li, T.-T.; Lin, Q.; Lin, J.-H.; Lou, C.-W. Oxalic Acid-Induced Photodissolution of Ferrihydrite and the Fate of Loaded As(V): Kinetics and Mechanism. Nanomaterials 2019, 9, 1143.

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