Dai, J.; Tang, W.; Li, T.; Xu, C.; Zhao, M.; Ji, P.; Li, X.; Zhang, F.; Cai, H.; Wu, X.
First-Principles Study of Halide Modulation on Deep-Level Traps in FAPbI3. Nanomaterials 2025, 15, 981.
https://doi.org/10.3390/nano15130981
AMA Style
Dai J, Tang W, Li T, Xu C, Zhao M, Ji P, Li X, Zhang F, Cai H, Wu X.
First-Principles Study of Halide Modulation on Deep-Level Traps in FAPbI3. Nanomaterials. 2025; 15(13):981.
https://doi.org/10.3390/nano15130981
Chicago/Turabian Style
Dai, Jiaqi, Wenchao Tang, Tingfeng Li, Cuiping Xu, Min Zhao, Peiqi Ji, Xiaolei Li, Fengming Zhang, Hongling Cai, and Xiaoshan Wu.
2025. "First-Principles Study of Halide Modulation on Deep-Level Traps in FAPbI3" Nanomaterials 15, no. 13: 981.
https://doi.org/10.3390/nano15130981
APA Style
Dai, J., Tang, W., Li, T., Xu, C., Zhao, M., Ji, P., Li, X., Zhang, F., Cai, H., & Wu, X.
(2025). First-Principles Study of Halide Modulation on Deep-Level Traps in FAPbI3. Nanomaterials, 15(13), 981.
https://doi.org/10.3390/nano15130981