Zhang, K.; Yu, Y.; Zhu, N.; Zhang, S.; Sun, J.; Ding, S.; Zhang, D.W.
High-Performance and Fabrication-Tolerant 3 dB Adiabatic Coupler Based on Ultralow-Loss Silicon Waveguide by Tri-Layer Hard Mask Etching Process. Nanomaterials 2025, 15, 947.
https://doi.org/10.3390/nano15120947
AMA Style
Zhang K, Yu Y, Zhu N, Zhang S, Sun J, Ding S, Zhang DW.
High-Performance and Fabrication-Tolerant 3 dB Adiabatic Coupler Based on Ultralow-Loss Silicon Waveguide by Tri-Layer Hard Mask Etching Process. Nanomaterials. 2025; 15(12):947.
https://doi.org/10.3390/nano15120947
Chicago/Turabian Style
Zhang, Ke, Yunchu Yu, Nanfei Zhu, Senlin Zhang, Jie Sun, Shijin Ding, and David Wei Zhang.
2025. "High-Performance and Fabrication-Tolerant 3 dB Adiabatic Coupler Based on Ultralow-Loss Silicon Waveguide by Tri-Layer Hard Mask Etching Process" Nanomaterials 15, no. 12: 947.
https://doi.org/10.3390/nano15120947
APA Style
Zhang, K., Yu, Y., Zhu, N., Zhang, S., Sun, J., Ding, S., & Zhang, D. W.
(2025). High-Performance and Fabrication-Tolerant 3 dB Adiabatic Coupler Based on Ultralow-Loss Silicon Waveguide by Tri-Layer Hard Mask Etching Process. Nanomaterials, 15(12), 947.
https://doi.org/10.3390/nano15120947